High-Power Laser Objectives
LBTEK High-Power Laser Objectives are suitable for brightfield observation and near-infrared laser processing. They feature an infinity-corrected plan-apochromatic design, capable of correction from the visible to the near-infrared region. These high-power laser objectives can be used in a variety of applications requiring high power, such as laser cutting or engraving. At lower powers, focused lasers can be used for wafer inspection. They also offer a certain degree of transmission in the visible light band, enabling the use of He-Ne lasers as guide light. The laser processing wavelength range is 1030 nm to 1064 nm, and the mounting thread is an M26 mm × 0.706 mm external thread.
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High-Power Laser Objectives HP-PLNAPO50XNIR-HR -
High-Power Laser Objectives HP-PLNAPO50XNIR -
High-Power Laser Objectives HP-PLNAPO20XNIR-HR -
High-Power Laser Objectives HP-PLNAPO20XNIR -
High-Power Laser Objectives HP-PLNAPO20XNIR-HR -
High-Power Laser Objectives HP-PLNAPO50XNIR-HR -
High-Power Laser Objectives HP-PLNAPO50XNIR -
High-Power Laser Objectives HP-PLNAPO20XNIR