{"title":"Broadband UV-NIR Chirped Mirrors","description":"\u003cp\u003eBroadband chirped mirrors covering UV (255 nm) to NIR (1250 nm) for ultrafast laser systems. Includes \u003cstrong\u003ecompressor mirrors\u003c\/strong\u003e (negative GDD, -25 to -200 fs²) for pulse compression and \u003cstrong\u003estretcher mirrors\u003c\/strong\u003e (positive GDD, +100 fs²) for chirped pulse amplification. Compatible with Ti:Sapphire, OPA, OPCPA, fs UV systems, and sub-100 fs pulse engineering applications.\u003c\/p\u003e","products":[{"product_id":"uv-chirped-mirror-255-265nm-50fs","title":"UV Chirped Mirror HD7102-25.4-6.35","description":"\u003cdiv\u003e\n  \u003ch3\u003eOverview\u003c\/h3\u003e\n  \u003cp\u003eThe \u003cstrong\u003eUV\/Visible Chirped Mirror 255-265nm -50fs²\u003c\/strong\u003e (\u003cstrong\u003eUltrafast Innovations HD7102\u003c\/strong\u003e) is a moderate-GDD dispersive mirror engineered for ultrafast laser dispersion management, providing -50 fs² of group delay dispersion per bounce across the 255–265 nm operating bandwidth.\u003c\/p\u003e\n  \u003cp\u003eWith -50 fs²\/bounce, this mirror provides moderate negative group delay dispersion per reflection — supporting compressor designs that balance ripple control against bounce count and footprint. The single-angle BBDM design integrates cleanly into both intracavity and external compressor geometries.\u003c\/p\u003e\n\n  \u003ch3\u003eApplications\u003c\/h3\u003e\n  \u003cul\u003e\n    \u003cli\u003eKBBF \/ KDP UV harmonic generation pulse-conditioning\u003c\/li\u003e\n    \u003cli\u003eDeep-UV pump-probe spectroscopy compressor stages\u003c\/li\u003e\n    \u003cli\u003eExcimer pre-pulse spectral shaping\u003c\/li\u003e\n    \u003cli\u003eFourth-harmonic Ti:Sapphire pulse management\u003c\/li\u003e\n  \u003c\/ul\u003e\n\n  \u003ch3\u003eConstruction \u0026amp; Performance\u003c\/h3\u003e\n  \u003cp\u003eManufactured on a 25.4 mm diameter × 6.35 mm thick UVFS substrate with dielectric multilayer coating, \u003cem\u003eR\u0026gt;90.0%@255-265nm\u003c\/em\u003e. The mirror operates at 5° angle of incidence with p- and s-polarization compatibility. The coating provides exceptional layer density, low absorption losses, and long-term spectral stability — characteristics required for dependable performance in fs-laser oscillator and amplifier chains.\u003c\/p\u003e\n\n  \u003ch3\u003eStorage \u0026amp; Handling\u003c\/h3\u003e\n  \u003cp\u003eOperate at 25 °C, 40–60% RH. Clean only with \u0026gt;99% optical-grade ethanol and lint-free lens tissue using single-pass drag method. Avoid abrasive cloths and water.\u003c\/p\u003e\n\u003c\/div\u003e\n","brand":"WaveQuanta","offers":[{"title":"Default Title","offer_id":47473870897306,"sku":"HD7102-25.4-6.35","price":781.0,"currency_code":"SGD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0734\/6156\/3546\/files\/15_08235348407063711_350.png?v=1772511910"},{"product_id":"uv-chirped-mirror-255-277nm-145fs","title":"UV Chirped Mirror HD100-25.4-6.35","description":"\u003cdiv\u003e\n  \u003ch3\u003eOverview\u003c\/h3\u003e\n  \u003cp\u003eThe \u003cstrong\u003eUV\/Visible Chirped Mirror 255-277nm -145fs²\u003c\/strong\u003e (\u003cstrong\u003eUltrafast Innovations HD100\u003c\/strong\u003e) is a high-GDD dispersive mirror engineered for ultrafast laser dispersion management, providing -145 fs² of group delay dispersion per bounce across the 255–277 nm operating bandwidth.\u003c\/p\u003e\n  \u003cp\u003eWith -145 fs²\/bounce, this mirror provides substantial negative group delay dispersion per reflection — supporting compressor designs that balance ripple control against bounce count and footprint. The single-angle BBDM design integrates cleanly into both intracavity and external compressor geometries.\u003c\/p\u003e\n\n  \u003ch3\u003eApplications\u003c\/h3\u003e\n  \u003cul\u003e\n    \u003cli\u003eKBBF \/ KDP UV harmonic generation pulse-conditioning\u003c\/li\u003e\n    \u003cli\u003eDeep-UV pump-probe spectroscopy compressor stages\u003c\/li\u003e\n    \u003cli\u003eExcimer pre-pulse spectral shaping\u003c\/li\u003e\n    \u003cli\u003eFourth-harmonic Ti:Sapphire pulse management\u003c\/li\u003e\n  \u003c\/ul\u003e\n\n  \u003ch3\u003eConstruction \u0026amp; Performance\u003c\/h3\u003e\n  \u003cp\u003eManufactured on a 25.4 mm diameter × 6.35 mm thick UVFS substrate with dielectric multilayer coating, \u003cem\u003eR\u0026gt;80.0%@255-277nm\u003c\/em\u003e. The mirror operates at 5° angle of incidence with p-polarized light. The coating provides exceptional layer density, low absorption losses, and long-term spectral stability — characteristics required for dependable performance in fs-laser oscillator and amplifier chains.\u003c\/p\u003e\n\n  \u003ch3\u003eStorage \u0026amp; Handling\u003c\/h3\u003e\n  \u003cp\u003eOperate at 25 °C, 40–60% RH. Clean only with \u0026gt;99% optical-grade ethanol and lint-free lens tissue using single-pass drag method. Avoid abrasive cloths and water.\u003c\/p\u003e\n\u003c\/div\u003e\n","brand":"WaveQuanta","offers":[{"title":"Default Title","offer_id":47473870930074,"sku":"HD100-25.4-6.35","price":1026.0,"currency_code":"SGD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0734\/6156\/3546\/files\/15_08235348409839817_350.png?v=1772511912"},{"product_id":"uv-chirped-mirror-40fs","title":"UV Chirped Mirror CM7205-12.7-6.35","description":"\u003cdiv\u003e\n  \u003ch3\u003eOverview\u003c\/h3\u003e\n  \u003cp\u003eThe \u003cstrong\u003eUV\/Visible Chirped Mirror -40fs²\u003c\/strong\u003e (\u003cstrong\u003eUltrafast Innovations CM7205\u003c\/strong\u003e) is a moderate-GDD dispersive mirror engineered for ultrafast laser dispersion management, providing -40 fs² of group delay dispersion per bounce across the 270–350 nm operating bandwidth.\u003c\/p\u003e\n  \u003cp\u003eWith -40 fs²\/bounce, this mirror provides moderate negative group delay dispersion per reflection — supporting compressor designs that balance ripple control against bounce count and footprint. The single-angle BBDM design integrates cleanly into both intracavity and external compressor geometries.\u003c\/p\u003e\n\n  \u003ch3\u003eApplications\u003c\/h3\u003e\n  \u003cul\u003e\n    \u003cli\u003eUV third-harmonic Ti:Sapphire dispersion management\u003c\/li\u003e\n    \u003cli\u003eSub-100 fs UV laser compressor stages\u003c\/li\u003e\n    \u003cli\u003eUV pump-probe spectroscopy pulse conditioning\u003c\/li\u003e\n    \u003cli\u003eExcimer-laser harmonic-line shaping\u003c\/li\u003e\n  \u003c\/ul\u003e\n\n  \u003ch3\u003eConstruction \u0026amp; Performance\u003c\/h3\u003e\n  \u003cp\u003eManufactured on a 12.7 mm diameter × 6.35 mm thick UVFS substrate with dielectric multilayer coating, \u003cem\u003eR\u0026gt;95%@270-350nm\u003c\/em\u003e. The mirror operates at 45° angle of incidence. The coating provides exceptional layer density, low absorption losses, and long-term spectral stability — characteristics required for dependable performance in fs-laser oscillator and amplifier chains.\u003c\/p\u003e\n  \u003cp\u003eThe 0.2 J\/cm² damage threshold (specified at 800nm) supports typical ultrafast laser fluences. Compatible with research-grade and industrial fs-laser systems requiring controlled dispersion at this operating wavelength.\u003c\/p\u003e\n\n  \u003ch3\u003eStorage \u0026amp; Handling\u003c\/h3\u003e\n  \u003cp\u003eOperate at 25 °C, 40–60% RH. Clean only with \u0026gt;99% optical-grade ethanol and lint-free lens tissue using single-pass drag method. Avoid abrasive cloths and water.\u003c\/p\u003e\n\u003c\/div\u003e\n","brand":"WaveQuanta","offers":[{"title":"Default Title","offer_id":47473871028378,"sku":"CM7205-12.7-6.35","price":558.0,"currency_code":"SGD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0734\/6156\/3546\/files\/15_08235348415339301_350.png?v=1772511916"},{"product_id":"uv-chirped-mirror-25fs","title":"UV Chirped Mirror PC310-25.4-6.35","description":"\u003cdiv\u003e\n  \u003ch3\u003eOverview\u003c\/h3\u003e\n  \u003cp\u003eThe \u003cstrong\u003eUV\/Visible Chirped Mirror -25fs²\u003c\/strong\u003e (\u003cstrong\u003eUltrafast Innovations PC310\u003c\/strong\u003e) is a low-GDD dispersive mirror engineered for ultrafast laser dispersion management, providing -25 fs² of group delay dispersion per bounce across the 300–600 nm operating bandwidth.\u003c\/p\u003e\n  \u003cp\u003eWith -25 fs²\/bounce, this mirror provides fine-tuning negative group delay dispersion per reflection — supporting compressor designs that balance ripple control against bounce count and footprint. The single-angle BBDM design integrates cleanly into both intracavity and external compressor geometries.\u003c\/p\u003e\n\n  \u003ch3\u003eApplications\u003c\/h3\u003e\n  \u003cul\u003e\n    \u003cli\u003eFrequency-doubled Ti:Sapphire dispersion management\u003c\/li\u003e\n    \u003cli\u003eBlue\/violet ultrafast laser compressor stages\u003c\/li\u003e\n    \u003cli\u003eFluorescence imaging at second-harmonic wavelengths\u003c\/li\u003e\n    \u003cli\u003eCr:Forsterite SHG pulse conditioning\u003c\/li\u003e\n  \u003c\/ul\u003e\n\n  \u003ch3\u003eConstruction \u0026amp; Performance\u003c\/h3\u003e\n  \u003cp\u003eManufactured on a 25.4 mm diameter × 6.35 mm thick UVFS substrate with dielectric multilayer coating, \u003cem\u003eR\u0026gt;92.0%@300-600nm\u003c\/em\u003e. The mirror operates at 5° angle of incidence with p-polarized light. The coating provides exceptional layer density, low absorption losses, and long-term spectral stability — characteristics required for dependable performance in fs-laser oscillator and amplifier chains.\u003c\/p\u003e\n  \u003cp\u003eThe 0.2 J\/cm² damage threshold (specified at 800nm) supports typical ultrafast laser fluences. Compatible with research-grade and industrial fs-laser systems requiring controlled dispersion at this operating wavelength.\u003c\/p\u003e\n\n  \u003ch3\u003eStorage \u0026amp; Handling\u003c\/h3\u003e\n  \u003cp\u003eOperate at 25 °C, 40–60% RH. Clean only with \u0026gt;99% optical-grade ethanol and lint-free lens tissue using single-pass drag method. Avoid abrasive cloths and water.\u003c\/p\u003e\n\u003c\/div\u003e\n","brand":"WaveQuanta","offers":[{"title":"Default Title","offer_id":47473871061146,"sku":"PC310-25.4-6.35","price":948.0,"currency_code":"SGD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0734\/6156\/3546\/files\/15_08235348417021861_350.png?v=1772511918"},{"product_id":"uv-chirped-mirror-350-450nm-50fs","title":"UV Chirped Mirror CM82-25.4-6.35","description":"\u003cdiv\u003e\n  \u003ch3\u003eOverview\u003c\/h3\u003e\n  \u003cp\u003eThe \u003cstrong\u003eUV\/Visible Chirped Mirror 350-450nm -50fs²\u003c\/strong\u003e (\u003cstrong\u003eUltrafast Innovations CM82\u003c\/strong\u003e) is a moderate-GDD dispersive mirror engineered for ultrafast laser dispersion management, providing -50 fs² of group delay dispersion per bounce across the 350–450 nm operating bandwidth.\u003c\/p\u003e\n  \u003cp\u003eWith -50 fs²\/bounce, this mirror provides moderate negative group delay dispersion per reflection — supporting compressor designs that balance ripple control against bounce count and footprint. The single-angle BBDM design integrates cleanly into both intracavity and external compressor geometries.\u003c\/p\u003e\n\n  \u003ch3\u003eApplications\u003c\/h3\u003e\n  \u003cul\u003e\n    \u003cli\u003eFrequency-doubled Ti:Sapphire dispersion management\u003c\/li\u003e\n    \u003cli\u003eBlue\/violet ultrafast laser compressor stages\u003c\/li\u003e\n    \u003cli\u003eFluorescence imaging at second-harmonic wavelengths\u003c\/li\u003e\n    \u003cli\u003eCr:Forsterite SHG pulse conditioning\u003c\/li\u003e\n  \u003c\/ul\u003e\n\n  \u003ch3\u003eConstruction \u0026amp; Performance\u003c\/h3\u003e\n  \u003cp\u003eManufactured on a 25.4 mm diameter × 6.35 mm thick UVFS substrate with dielectric multilayer coating, \u003cem\u003eR\u0026gt;99.0%@350-450nm\u003c\/em\u003e. The mirror operates at 5° angle of incidence with p-polarized light. The coating provides exceptional layer density, low absorption losses, and long-term spectral stability — characteristics required for dependable performance in fs-laser oscillator and amplifier chains.\u003c\/p\u003e\n\n  \u003ch3\u003eStorage \u0026amp; Handling\u003c\/h3\u003e\n  \u003cp\u003eOperate at 25 °C, 40–60% RH. Clean only with \u0026gt;99% optical-grade ethanol and lint-free lens tissue using single-pass drag method. Avoid abrasive cloths and water.\u003c\/p\u003e\n\u003c\/div\u003e\n","brand":"WaveQuanta","offers":[{"title":"Default Title","offer_id":47473871093914,"sku":"CM82-25.4-6.35","price":898.0,"currency_code":"SGD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0734\/6156\/3546\/files\/15_08235348419879477_350.png?v=1772511921"},{"product_id":"uv-chirped-mirror-350-450nm-50fs-1","title":"UV Chirped Mirror CM82-38.1-12.7","description":"\u003cdiv\u003e\n  \u003ch3\u003eOverview\u003c\/h3\u003e\n  \u003cp\u003eThe \u003cstrong\u003eUV\/Visible Chirped Mirror 350-450nm -50fs²\u003c\/strong\u003e (\u003cstrong\u003eUltrafast Innovations CM82\u003c\/strong\u003e) is a moderate-GDD dispersive mirror engineered for ultrafast laser dispersion management, providing -50 fs² of group delay dispersion per bounce across the 350–450 nm operating bandwidth.\u003c\/p\u003e\n  \u003cp\u003eWith -50 fs²\/bounce, this mirror provides moderate negative group delay dispersion per reflection — supporting compressor designs that balance ripple control against bounce count and footprint. The single-angle BBDM design integrates cleanly into both intracavity and external compressor geometries.\u003c\/p\u003e\n\n  \u003ch3\u003eApplications\u003c\/h3\u003e\n  \u003cul\u003e\n    \u003cli\u003eFrequency-doubled Ti:Sapphire dispersion management\u003c\/li\u003e\n    \u003cli\u003eBlue\/violet ultrafast laser compressor stages\u003c\/li\u003e\n    \u003cli\u003eFluorescence imaging at second-harmonic wavelengths\u003c\/li\u003e\n    \u003cli\u003eCr:Forsterite SHG pulse conditioning\u003c\/li\u003e\n  \u003c\/ul\u003e\n\n  \u003ch3\u003eConstruction \u0026amp; Performance\u003c\/h3\u003e\n  \u003cp\u003eManufactured on a 38.1 mm diameter × 12.7 mm thick UVFS substrate with dielectric multilayer coating, \u003cem\u003eR\u0026gt;99.0%@350-450nm\u003c\/em\u003e. The mirror operates at 5° angle of incidence with p-polarized light. The coating provides exceptional layer density, low absorption losses, and long-term spectral stability — characteristics required for dependable performance in fs-laser oscillator and amplifier chains.\u003c\/p\u003e\n\n  \u003ch3\u003eStorage \u0026amp; Handling\u003c\/h3\u003e\n  \u003cp\u003eOperate at 25 °C, 40–60% RH. Clean only with \u0026gt;99% optical-grade ethanol and lint-free lens tissue using single-pass drag method. Avoid abrasive cloths and water.\u003c\/p\u003e\n\u003c\/div\u003e\n","brand":"WaveQuanta","offers":[{"title":"Default Title","offer_id":47473871126682,"sku":"CM82-38.1-12.7","price":927.0,"currency_code":"SGD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0734\/6156\/3546\/files\/15_08235348422627464_350.png?v=1772511923"},{"product_id":"uv-chirped-mirror-355-460nm-50fs","title":"UV Chirped Mirror HD7203-25.4-6.35","description":"\u003cdiv\u003e\n  \u003ch3\u003eOverview\u003c\/h3\u003e\n  \u003cp\u003eThe \u003cstrong\u003eUV\/Visible Chirped Mirror 355-460nm -50fs²\u003c\/strong\u003e (\u003cstrong\u003eUltrafast Innovations HD7203\u003c\/strong\u003e) is a moderate-GDD dispersive mirror engineered for ultrafast laser dispersion management, providing -50 fs² of group delay dispersion per bounce across the 355–460 nm operating bandwidth.\u003c\/p\u003e\n  \u003cp\u003eWith -50 fs²\/bounce, this mirror provides moderate negative group delay dispersion per reflection — supporting compressor designs that balance ripple control against bounce count and footprint. The single-angle BBDM design integrates cleanly into both intracavity and external compressor geometries.\u003c\/p\u003e\n\n  \u003ch3\u003eApplications\u003c\/h3\u003e\n  \u003cul\u003e\n    \u003cli\u003eFrequency-doubled Ti:Sapphire dispersion management\u003c\/li\u003e\n    \u003cli\u003eBlue\/violet ultrafast laser compressor stages\u003c\/li\u003e\n    \u003cli\u003eFluorescence imaging at second-harmonic wavelengths\u003c\/li\u003e\n    \u003cli\u003eCr:Forsterite SHG pulse conditioning\u003c\/li\u003e\n  \u003c\/ul\u003e\n\n  \u003ch3\u003eConstruction \u0026amp; Performance\u003c\/h3\u003e\n  \u003cp\u003eManufactured on a 25.4 mm diameter × 6.35 mm thick UVFS substrate with dielectric multilayer coating, \u003cem\u003eR\u0026gt;99.5%@355-460nm\u003c\/em\u003e. The mirror operates at 5° angle of incidence with p- and s-polarization compatibility. The coating provides exceptional layer density, low absorption losses, and long-term spectral stability — characteristics required for dependable performance in fs-laser oscillator and amplifier chains.\u003c\/p\u003e\n\n  \u003ch3\u003eStorage \u0026amp; Handling\u003c\/h3\u003e\n  \u003cp\u003eOperate at 25 °C, 40–60% RH. Clean only with \u0026gt;99% optical-grade ethanol and lint-free lens tissue using single-pass drag method. Avoid abrasive cloths and water.\u003c\/p\u003e\n\u003c\/div\u003e\n","brand":"WaveQuanta","offers":[{"title":"Default Title","offer_id":47473871224986,"sku":"HD7203-25.4-6.35","price":488.0,"currency_code":"SGD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0734\/6156\/3546\/files\/15_08235348428121547_350.png?v=1772511928"},{"product_id":"uv-chirped-mirror-380-425nm-120fs","title":"UV Chirped Mirror HD7105-25.4-6.35","description":"\u003cdiv\u003e\n  \u003ch3\u003eOverview\u003c\/h3\u003e\n  \u003cp\u003eThe \u003cstrong\u003eUV\/Visible Chirped Mirror 380-425nm -120fs²\u003c\/strong\u003e (\u003cstrong\u003eUltrafast Innovations HD7105\u003c\/strong\u003e) is a high-GDD dispersive mirror engineered for ultrafast laser dispersion management, providing -120 fs² of group delay dispersion per bounce across the 380–425 nm operating bandwidth.\u003c\/p\u003e\n  \u003cp\u003eWith -120 fs²\/bounce, this mirror provides substantial negative group delay dispersion per reflection — supporting compressor designs that balance ripple control against bounce count and footprint. The single-angle BBDM design integrates cleanly into both intracavity and external compressor geometries.\u003c\/p\u003e\n\n  \u003ch3\u003eApplications\u003c\/h3\u003e\n  \u003cul\u003e\n    \u003cli\u003eFrequency-doubled Ti:Sapphire dispersion management\u003c\/li\u003e\n    \u003cli\u003eBlue\/violet ultrafast laser compressor stages\u003c\/li\u003e\n    \u003cli\u003eFluorescence imaging at second-harmonic wavelengths\u003c\/li\u003e\n    \u003cli\u003eCr:Forsterite SHG pulse conditioning\u003c\/li\u003e\n  \u003c\/ul\u003e\n\n  \u003ch3\u003eConstruction \u0026amp; Performance\u003c\/h3\u003e\n  \u003cp\u003eManufactured on a 25.4 mm diameter × 6.35 mm thick UVFS substrate with dielectric multilayer coating, \u003cem\u003eR\u0026gt;99.0%@380-425nm\u003c\/em\u003e. The mirror operates at 5° angle of incidence with p- and s-polarization compatibility. The coating provides exceptional layer density, low absorption losses, and long-term spectral stability — characteristics required for dependable performance in fs-laser oscillator and amplifier chains.\u003c\/p\u003e\n\n  \u003ch3\u003eStorage \u0026amp; Handling\u003c\/h3\u003e\n  \u003cp\u003eOperate at 25 °C, 40–60% RH. Clean only with \u0026gt;99% optical-grade ethanol and lint-free lens tissue using single-pass drag method. Avoid abrasive cloths and water.\u003c\/p\u003e\n\u003c\/div\u003e\n","brand":"WaveQuanta","offers":[{"title":"Default Title","offer_id":47473871290522,"sku":"HD7105-25.4-6.35","price":898.0,"currency_code":"SGD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0734\/6156\/3546\/files\/15_08235348433657224_350.png?v=1772511932"},{"product_id":"uv-chirped-mirror-420-510nm-50fs","title":"UV Chirped Mirror HD7215-25.4-6.35","description":"\u003cdiv\u003e\n  \u003ch3\u003eOverview\u003c\/h3\u003e\n  \u003cp\u003eThe \u003cstrong\u003eUV\/Visible Chirped Mirror 420-510nm -50fs²\u003c\/strong\u003e (\u003cstrong\u003eUltrafast Innovations HD7215\u003c\/strong\u003e) is a moderate-GDD dispersive mirror engineered for ultrafast laser dispersion management, providing -50 fs² of group delay dispersion per bounce across the 420–510 nm operating bandwidth.\u003c\/p\u003e\n  \u003cp\u003eWith -50 fs²\/bounce, this mirror provides moderate negative group delay dispersion per reflection — supporting compressor designs that balance ripple control against bounce count and footprint. The single-angle BBDM design integrates cleanly into both intracavity and external compressor geometries.\u003c\/p\u003e\n\n  \u003ch3\u003eApplications\u003c\/h3\u003e\n  \u003cul\u003e\n    \u003cli\u003eFrequency-doubled Ti:Sapphire dispersion management\u003c\/li\u003e\n    \u003cli\u003eBlue\/violet ultrafast laser compressor stages\u003c\/li\u003e\n    \u003cli\u003eFluorescence imaging at second-harmonic wavelengths\u003c\/li\u003e\n    \u003cli\u003eCr:Forsterite SHG pulse conditioning\u003c\/li\u003e\n  \u003c\/ul\u003e\n\n  \u003ch3\u003eConstruction \u0026amp; Performance\u003c\/h3\u003e\n  \u003cp\u003eManufactured on a 25.4 mm diameter × 6.35 mm thick UVFS substrate with dielectric multilayer coating, \u003cem\u003eR\u0026gt;99.5%@420-510nm\u003c\/em\u003e. The mirror operates at 5° angle of incidence with p- and s-polarization compatibility. The coating provides exceptional layer density, low absorption losses, and long-term spectral stability — characteristics required for dependable performance in fs-laser oscillator and amplifier chains.\u003c\/p\u003e\n\n  \u003ch3\u003eStorage \u0026amp; Handling\u003c\/h3\u003e\n  \u003cp\u003eOperate at 25 °C, 40–60% RH. Clean only with \u0026gt;99% optical-grade ethanol and lint-free lens tissue using single-pass drag method. Avoid abrasive cloths and water.\u003c\/p\u003e\n\u003c\/div\u003e\n","brand":"WaveQuanta","offers":[{"title":"Default Title","offer_id":47473871323290,"sku":"HD7215-25.4-6.35","price":683.0,"currency_code":"SGD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0734\/6156\/3546\/files\/15_08235348436416890_350.png?v=1772511933"},{"product_id":"uv-chirped-mirror-420-510nm-50fs-1","title":"UV Chirped Mirror HD7215-50.8-12.7","description":"\u003cdiv\u003e\n  \u003ch3\u003eOverview\u003c\/h3\u003e\n  \u003cp\u003eThe \u003cstrong\u003eUV\/Visible Chirped Mirror 420-510nm -50fs²\u003c\/strong\u003e (\u003cstrong\u003eUltrafast Innovations HD7215\u003c\/strong\u003e) is a moderate-GDD dispersive mirror engineered for ultrafast laser dispersion management, providing -50 fs² of group delay dispersion per bounce across the 420–510 nm operating bandwidth.\u003c\/p\u003e\n  \u003cp\u003eWith -50 fs²\/bounce, this mirror provides moderate negative group delay dispersion per reflection — supporting compressor designs that balance ripple control against bounce count and footprint. The single-angle BBDM design integrates cleanly into both intracavity and external compressor geometries.\u003c\/p\u003e\n\n  \u003ch3\u003eApplications\u003c\/h3\u003e\n  \u003cul\u003e\n    \u003cli\u003eFrequency-doubled Ti:Sapphire dispersion management\u003c\/li\u003e\n    \u003cli\u003eBlue\/violet ultrafast laser compressor stages\u003c\/li\u003e\n    \u003cli\u003eFluorescence imaging at second-harmonic wavelengths\u003c\/li\u003e\n    \u003cli\u003eCr:Forsterite SHG pulse conditioning\u003c\/li\u003e\n  \u003c\/ul\u003e\n\n  \u003ch3\u003eConstruction \u0026amp; Performance\u003c\/h3\u003e\n  \u003cp\u003eManufactured on a 50.8 mm diameter × 12.7 mm thick UVFS substrate with dielectric multilayer coating, \u003cem\u003eR\u0026gt;99.5%@420-510nm\u003c\/em\u003e. The mirror operates at 5° angle of incidence with p- and s-polarization compatibility. The coating provides exceptional layer density, low absorption losses, and long-term spectral stability — characteristics required for dependable performance in fs-laser oscillator and amplifier chains.\u003c\/p\u003e\n\n  \u003ch3\u003eStorage \u0026amp; Handling\u003c\/h3\u003e\n  \u003cp\u003eOperate at 25 °C, 40–60% RH. Clean only with \u0026gt;99% optical-grade ethanol and lint-free lens tissue using single-pass drag method. Avoid abrasive cloths and water.\u003c\/p\u003e\n\u003c\/div\u003e\n","brand":"WaveQuanta","offers":[{"title":"Default Title","offer_id":47473871356058,"sku":"HD7215-50.8-12.7","price":837.0,"currency_code":"SGD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0734\/6156\/3546\/files\/15_08235348439141729_350.png?v=1772511935"},{"product_id":"uv-chirped-mirror-505-525nm-200fs","title":"Visible Chirped Mirror PP-UVFS-25.4-6.35-LLM302","description":"\u003cdiv\u003e\n  \u003ch3\u003eOverview\u003c\/h3\u003e\n  \u003cp\u003eThe \u003cstrong\u003eUV\/Visible Chirped Mirror 505-525nm -200fs²\u003c\/strong\u003e (\u003cstrong\u003eOptoman PP\u003c\/strong\u003e) is a high-GDD dispersive mirror engineered for ultrafast laser dispersion management, providing -200 fs² of group delay dispersion per bounce across the 505–525 nm operating bandwidth.\u003c\/p\u003e\n  \u003cp\u003eWith -200 fs²\/bounce, this mirror provides deep negative group delay dispersion per reflection — supporting compressor designs that balance ripple control against bounce count and footprint. The single-angle BBDM design integrates cleanly into both intracavity and external compressor geometries.\u003c\/p\u003e\n\n  \u003ch3\u003eApplications\u003c\/h3\u003e\n  \u003cul\u003e\n    \u003cli\u003eFrequency-doubled Ti:Sapphire dispersion management\u003c\/li\u003e\n    \u003cli\u003eBlue\/violet ultrafast laser compressor stages\u003c\/li\u003e\n    \u003cli\u003eFluorescence imaging at second-harmonic wavelengths\u003c\/li\u003e\n    \u003cli\u003eCr:Forsterite SHG pulse conditioning\u003c\/li\u003e\n  \u003c\/ul\u003e\n\n  \u003ch3\u003eConstruction \u0026amp; Performance\u003c\/h3\u003e\n  \u003cp\u003eManufactured on a 25.4 mm diameter × 6.35 mm thick UVFS substrate with ion beam sputtered (IBS) dielectric multilayer coating, \u003cem\u003eS1:HRs\u0026gt;99.9% @ 505-525 nm \/ S2:Uncoated\u003c\/em\u003e. The mirror operates at 45° angle of incidence. The coating provides exceptional layer density, low absorption losses, and long-term spectral stability — characteristics required for dependable performance in fs-laser oscillator and amplifier chains.\u003c\/p\u003e\n\n  \u003ch3\u003eStorage \u0026amp; Handling\u003c\/h3\u003e\n  \u003cp\u003eOperate at 25 °C, 40–60% RH. Clean only with \u0026gt;99% optical-grade ethanol and lint-free lens tissue using single-pass drag method. Avoid abrasive cloths and water.\u003c\/p\u003e\n\u003c\/div\u003e\n","brand":"WaveQuanta","offers":[{"title":"Default Title","offer_id":47473871454362,"sku":"PP-UVFS-25.4-6.35-LLM302","price":569.0,"currency_code":"SGD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0734\/6156\/3546\/files\/15_08235348444662629_350.png?v=1772511940"},{"product_id":"uv-chirped-mirror-600-1200nm-50fs","title":"Broadband Chirped Mirror CM2112-L-12.7-6.35","description":"\u003cdiv\u003e\n  \u003ch3\u003eOverview\u003c\/h3\u003e\n  \u003cp\u003eThe \u003cstrong\u003eUV\/Visible Chirped Mirror 600-1200nm -50fs²\u003c\/strong\u003e (\u003cstrong\u003eUltrafast Innovations CM2112\u003c\/strong\u003e) is a moderate-GDD dispersive mirror engineered for ultrafast laser dispersion management, providing -50 fs² of group delay dispersion per bounce across the 600–1200 nm operating bandwidth.\u003c\/p\u003e\n  \u003cp\u003eWith -50 fs²\/bounce, this mirror provides moderate negative group delay dispersion per reflection — supporting compressor designs that balance ripple control against bounce count and footprint. The single-angle BBDM design integrates cleanly into both intracavity and external compressor geometries.\u003c\/p\u003e\n\n  \u003ch3\u003eApplications\u003c\/h3\u003e\n  \u003cul\u003e\n    \u003cli\u003eTi:Sapphire \/ Yb-band crossover dispersion management\u003c\/li\u003e\n    \u003cli\u003eSub-50 fs pulse compression for OPCPA front-end seeders\u003c\/li\u003e\n    \u003cli\u003eMulti-photon microscopy excitation in NIR window\u003c\/li\u003e\n    \u003cli\u003eBroadband Cr:LiSAF \/ Cr:forsterite fs-laser compressor stages\u003c\/li\u003e\n  \u003c\/ul\u003e\n\n  \u003ch3\u003eConstruction \u0026amp; Performance\u003c\/h3\u003e\n  \u003cp\u003eManufactured on a 12.7 mm diameter × 6.35 mm thick UVFS substrate with dielectric multilayer coating, \u003cem\u003eR\u0026gt;98.5%@600-1200nm\u003c\/em\u003e. The mirror operates at 5° angle of incidence with p-polarized light. The coating provides exceptional layer density, low absorption losses, and long-term spectral stability — characteristics required for dependable performance in fs-laser oscillator and amplifier chains.\u003c\/p\u003e\n\n  \u003ch3\u003eStorage \u0026amp; Handling\u003c\/h3\u003e\n  \u003cp\u003eOperate at 25 °C, 40–60% RH. Clean only with \u0026gt;99% optical-grade ethanol and lint-free lens tissue using single-pass drag method. Avoid abrasive cloths and water.\u003c\/p\u003e\n\u003c\/div\u003e\n","brand":"WaveQuanta","offers":[{"title":"Default Title","offer_id":47473871519898,"sku":"CM2112-L-12.7-6.35","price":6002.7,"currency_code":"SGD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0734\/6156\/3546\/files\/15_08235348448080942_350.png?v=1772511942"},{"product_id":"uv-chirped-mirror-600-1200nm-50fs-1","title":"Broadband Chirped Mirror CM2112-S-12.7-6.35","description":"\u003cdiv\u003e\n  \u003ch3\u003eOverview\u003c\/h3\u003e\n  \u003cp\u003eThe \u003cstrong\u003eUV\/Visible Chirped Mirror 600-1200nm -50fs²\u003c\/strong\u003e (\u003cstrong\u003eUltrafast Innovations CM2112\u003c\/strong\u003e) is a moderate-GDD dispersive mirror engineered for ultrafast laser dispersion management, providing -50 fs² of group delay dispersion per bounce across the 600–1200 nm operating bandwidth.\u003c\/p\u003e\n  \u003cp\u003eWith -50 fs²\/bounce, this mirror provides moderate negative group delay dispersion per reflection — supporting compressor designs that balance ripple control against bounce count and footprint. The single-angle BBDM design integrates cleanly into both intracavity and external compressor geometries.\u003c\/p\u003e\n\n  \u003ch3\u003eApplications\u003c\/h3\u003e\n  \u003cul\u003e\n    \u003cli\u003eTi:Sapphire \/ Yb-band crossover dispersion management\u003c\/li\u003e\n    \u003cli\u003eSub-50 fs pulse compression for OPCPA front-end seeders\u003c\/li\u003e\n    \u003cli\u003eMulti-photon microscopy excitation in NIR window\u003c\/li\u003e\n    \u003cli\u003eBroadband Cr:LiSAF \/ Cr:forsterite fs-laser compressor stages\u003c\/li\u003e\n  \u003c\/ul\u003e\n\n  \u003ch3\u003eConstruction \u0026amp; Performance\u003c\/h3\u003e\n  \u003cp\u003eManufactured on a 12.7 mm diameter × 6.35 mm thick UVFS substrate with dielectric multilayer coating, \u003cem\u003eR\u0026gt;98.5%@600-1200nm\u003c\/em\u003e. The mirror operates at 5° angle of incidence with p-polarized light. The coating provides exceptional layer density, low absorption losses, and long-term spectral stability — characteristics required for dependable performance in fs-laser oscillator and amplifier chains.\u003c\/p\u003e\n\n  \u003ch3\u003eStorage \u0026amp; Handling\u003c\/h3\u003e\n  \u003cp\u003eOperate at 25 °C, 40–60% RH. Clean only with \u0026gt;99% optical-grade ethanol and lint-free lens tissue using single-pass drag method. Avoid abrasive cloths and water.\u003c\/p\u003e\n\u003c\/div\u003e\n","brand":"WaveQuanta","offers":[{"title":"Default Title","offer_id":47473871552666,"sku":"CM2112-S-12.7-6.35","price":2451.02,"currency_code":"SGD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0734\/6156\/3546\/files\/15_08235348450828971_350.png?v=1772511944"},{"product_id":"uv-chirped-mirror-50fs","title":"Broadband Chirped Mirror PC2020-L-25.4-6.35","description":"\u003cdiv\u003e\n  \u003ch3\u003eOverview\u003c\/h3\u003e\n  \u003cp\u003eThe \u003cstrong\u003eUV\/Visible Chirped Mirror -50fs²\u003c\/strong\u003e (\u003cstrong\u003eUltrafast Innovations PC2020\u003c\/strong\u003e) is a moderate-GDD dispersive mirror engineered for ultrafast laser dispersion management, providing -50 fs² of group delay dispersion per bounce across the 600–1200 nm operating bandwidth.\u003c\/p\u003e\n  \u003cp\u003eWith -50 fs²\/bounce, this mirror provides moderate negative group delay dispersion per reflection — supporting compressor designs that balance ripple control against bounce count and footprint. The single-angle BBDM design integrates cleanly into both intracavity and external compressor geometries.\u003c\/p\u003e\n\n  \u003ch3\u003eApplications\u003c\/h3\u003e\n  \u003cul\u003e\n    \u003cli\u003eTi:Sapphire \/ Yb-band crossover dispersion management\u003c\/li\u003e\n    \u003cli\u003eSub-50 fs pulse compression for OPCPA front-end seeders\u003c\/li\u003e\n    \u003cli\u003eMulti-photon microscopy excitation in NIR window\u003c\/li\u003e\n    \u003cli\u003eBroadband Cr:LiSAF \/ Cr:forsterite fs-laser compressor stages\u003c\/li\u003e\n  \u003c\/ul\u003e\n\n  \u003ch3\u003eConstruction \u0026amp; Performance\u003c\/h3\u003e\n  \u003cp\u003eManufactured on a 25.4 mm diameter × 6.35 mm thick UVFS substrate with dielectric multilayer coating, \u003cem\u003eR\u0026gt;99.0%@600-1200nm\u003c\/em\u003e. The mirror operates at 7° angle of incidence with p-polarized light. The coating provides exceptional layer density, low absorption losses, and long-term spectral stability — characteristics required for dependable performance in fs-laser oscillator and amplifier chains.\u003c\/p\u003e\n  \u003cp\u003eThe 0.2 J\/cm² damage threshold (specified at 800nm) supports typical ultrafast laser fluences. Compatible with research-grade and industrial fs-laser systems requiring controlled dispersion at this operating wavelength.\u003c\/p\u003e\n\n  \u003ch3\u003eStorage \u0026amp; Handling\u003c\/h3\u003e\n  \u003cp\u003eOperate at 25 °C, 40–60% RH. Clean only with \u0026gt;99% optical-grade ethanol and lint-free lens tissue using single-pass drag method. Avoid abrasive cloths and water.\u003c\/p\u003e\n\u003c\/div\u003e\n","brand":"WaveQuanta","offers":[{"title":"Default Title","offer_id":47473871618202,"sku":"PC2020-L-25.4-6.35","price":2451.02,"currency_code":"SGD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0734\/6156\/3546\/files\/15_08235348453566437_350.png?v=1772511947"},{"product_id":"uv-chirped-mirror-50fs-1","title":"Broadband Chirped Mirror PC2020-S-25.4-6.35","description":"\u003cdiv\u003e\n  \u003ch3\u003eOverview\u003c\/h3\u003e\n  \u003cp\u003eThe \u003cstrong\u003eUV\/Visible Chirped Mirror -50fs²\u003c\/strong\u003e (\u003cstrong\u003eUltrafast Innovations PC2020\u003c\/strong\u003e) is a moderate-GDD dispersive mirror engineered for ultrafast laser dispersion management, providing -50 fs² of group delay dispersion per bounce across the 600–1200 nm operating bandwidth.\u003c\/p\u003e\n  \u003cp\u003eWith -50 fs²\/bounce, this mirror provides moderate negative group delay dispersion per reflection — supporting compressor designs that balance ripple control against bounce count and footprint. The single-angle BBDM design integrates cleanly into both intracavity and external compressor geometries.\u003c\/p\u003e\n\n  \u003ch3\u003eApplications\u003c\/h3\u003e\n  \u003cul\u003e\n    \u003cli\u003eTi:Sapphire \/ Yb-band crossover dispersion management\u003c\/li\u003e\n    \u003cli\u003eSub-50 fs pulse compression for OPCPA front-end seeders\u003c\/li\u003e\n    \u003cli\u003eMulti-photon microscopy excitation in NIR window\u003c\/li\u003e\n    \u003cli\u003eBroadband Cr:LiSAF \/ Cr:forsterite fs-laser compressor stages\u003c\/li\u003e\n  \u003c\/ul\u003e\n\n  \u003ch3\u003eConstruction \u0026amp; Performance\u003c\/h3\u003e\n  \u003cp\u003eManufactured on a 25.4 mm diameter × 6.35 mm thick UVFS substrate with dielectric multilayer coating, \u003cem\u003eR\u0026gt;99.0%@600-1200nm\u003c\/em\u003e. The mirror operates at 7° angle of incidence with p-polarized light. The coating provides exceptional layer density, low absorption losses, and long-term spectral stability — characteristics required for dependable performance in fs-laser oscillator and amplifier chains.\u003c\/p\u003e\n  \u003cp\u003eThe 0.2 J\/cm² damage threshold (specified at 800nm) supports typical ultrafast laser fluences. Compatible with research-grade and industrial fs-laser systems requiring controlled dispersion at this operating wavelength.\u003c\/p\u003e\n\n  \u003ch3\u003eStorage \u0026amp; Handling\u003c\/h3\u003e\n  \u003cp\u003eOperate at 25 °C, 40–60% RH. Clean only with \u0026gt;99% optical-grade ethanol and lint-free lens tissue using single-pass drag method. Avoid abrasive cloths and water.\u003c\/p\u003e\n\u003c\/div\u003e\n","brand":"WaveQuanta","offers":[{"title":"Default Title","offer_id":47473871683738,"sku":"PC2020-S-25.4-6.35","price":2451.02,"currency_code":"SGD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0734\/6156\/3546\/files\/15_08235348456346260_350.png?v=1772511949"},{"product_id":"uv-chirped-mirror-0fs","title":"Visible Chirped Mirror TOD301-25.4-6.35","description":"\u003cdiv\u003e\n  \u003ch3\u003eOverview\u003c\/h3\u003e\n  \u003cp\u003eThe \u003cstrong\u003eUV\/Visible Chirped Mirror 0fs²\u003c\/strong\u003e (\u003cstrong\u003eUltrafast Innovations TOD301\u003c\/strong\u003e) is a zero-GDD reference dispersive mirror engineered for ultrafast laser dispersion management, providing +0 fs² of group delay dispersion per bounce across the 650–720 nm operating bandwidth.\u003c\/p\u003e\n\n  \u003ch3\u003eApplications\u003c\/h3\u003e\n  \u003cul\u003e\n    \u003cli\u003eReference mirror for high-reflectance applications\u003c\/li\u003e\n    \u003cli\u003eDelay-line use without dispersion impact\u003c\/li\u003e\n    \u003cli\u003eBeam steering in dispersion-controlled setups\u003c\/li\u003e\n    \u003cli\u003eCompressor null-mirror reference\u003c\/li\u003e\n  \u003c\/ul\u003e\n\n  \u003ch3\u003eConstruction \u0026amp; Performance\u003c\/h3\u003e\n  \u003cp\u003eManufactured on a 25.4 mm diameter × 6.35 mm thick UVFS substrate with dielectric multilayer coating, \u003cem\u003eR\u0026gt;95.0%@650-720nm\u003c\/em\u003e. The mirror operates at 5° angle of incidence with p- and s-polarization compatibility. The coating provides exceptional layer density, low absorption losses, and long-term spectral stability — characteristics required for dependable performance in fs-laser oscillator and amplifier chains.\u003c\/p\u003e\n  \u003cp\u003eThe 0.2 J\/cm² damage threshold (specified at 800nm) supports typical ultrafast laser fluences. Compatible with research-grade and industrial fs-laser systems requiring controlled dispersion at this operating wavelength.\u003c\/p\u003e\n\n  \u003ch3\u003eStorage \u0026amp; Handling\u003c\/h3\u003e\n  \u003cp\u003eOperate at 25 °C, 40–60% RH. Clean only with \u0026gt;99% optical-grade ethanol and lint-free lens tissue using single-pass drag method. Avoid abrasive cloths and water.\u003c\/p\u003e\n\u003c\/div\u003e\n","brand":"WaveQuanta","offers":[{"title":"Default Title","offer_id":47473871782042,"sku":"TOD301-25.4-6.35","price":488.0,"currency_code":"SGD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0734\/6156\/3546\/files\/15_08235348459117443_350.png?v=1772511951"},{"product_id":"uv-chirped-mirror-100fs","title":"Broadband Chirped Mirror PP-UVFS-50.8-9.52-LLM159","description":"\u003cdiv\u003e\n  \u003ch3\u003eOverview\u003c\/h3\u003e\n  \u003cp\u003eThe \u003cstrong\u003eUV\/Visible Chirped Mirror 100fs²\u003c\/strong\u003e (\u003cstrong\u003eOptoman PP\u003c\/strong\u003e) is a positive-dispersion (stretcher) dispersive mirror engineered for ultrafast laser dispersion management, providing +100 fs² of group delay dispersion per bounce across the 700–1100 nm operating bandwidth.\u003c\/p\u003e\n  \u003cp\u003eWith +100 fs²\/bounce of positive group delay dispersion, this mirror is intended for chirped-pulse amplification stretcher stages or upstream pulse engineering where controlled positive chirp is required, complementing downstream compressor optics.\u003c\/p\u003e\n\n  \u003ch3\u003eApplications\u003c\/h3\u003e\n  \u003cul\u003e\n    \u003cli\u003eCPA stretcher mirror replacement in pulse-stretching stages\u003c\/li\u003e\n    \u003cli\u003eRegenerative amplifier seeding pulse engineering\u003c\/li\u003e\n    \u003cli\u003eSub-nanosecond pulse stretching for chirped pulse amplification\u003c\/li\u003e\n    \u003cli\u003eSpectral phase pre-shaping for ultrafast amplifier chains\u003c\/li\u003e\n  \u003c\/ul\u003e\n\n  \u003ch3\u003eConstruction \u0026amp; Performance\u003c\/h3\u003e\n  \u003cp\u003eManufactured on a 50.8 mm diameter × 9.52 mm thick UVFS substrate with ion beam sputtered (IBS) dielectric multilayer coating, \u003cem\u003eS1:HRavg\u0026gt;99.0% @ 700 nm - 1100 nm \/ S2:Uncoated\u003c\/em\u003e. The mirror operates at 5° angle of incidence. The coating provides exceptional layer density, low absorption losses, and long-term spectral stability — characteristics required for dependable performance in fs-laser oscillator and amplifier chains.\u003c\/p\u003e\n  \u003cp\u003eThe 0.001 J\/cm² damage threshold (specified at 10 fs, 1030 nm) supports typical ultrafast laser fluences. Compatible with research-grade and industrial fs-laser systems requiring controlled dispersion at this operating wavelength.\u003c\/p\u003e\n\n  \u003ch3\u003eStorage \u0026amp; Handling\u003c\/h3\u003e\n  \u003cp\u003eOperate at 25 °C, 40–60% RH. Clean only with \u0026gt;99% optical-grade ethanol and lint-free lens tissue using single-pass drag method. Avoid abrasive cloths and water.\u003c\/p\u003e\n\u003c\/div\u003e\n","brand":"WaveQuanta","offers":[{"title":"Default Title","offer_id":47473871814810,"sku":"PP-UVFS-50.8-9.52-LLM159","price":4802.0,"currency_code":"SGD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0734\/6156\/3546\/files\/15_08235348461817916_350.png?v=1772511953"},{"product_id":"uv-chirped-mirror-100fs-1","title":"Broadband Chirped Mirror CM1512-25.4-6.35","description":"\u003cdiv\u003e\n  \u003ch3\u003eOverview\u003c\/h3\u003e\n  \u003cp\u003eThe \u003cstrong\u003eUV\/Visible Chirped Mirror 100fs²\u003c\/strong\u003e (\u003cstrong\u003eUltrafast Innovations CM1512\u003c\/strong\u003e) is a positive-dispersion (stretcher) dispersive mirror engineered for ultrafast laser dispersion management, providing +100 fs² of group delay dispersion per bounce across the 700–1100 nm operating bandwidth.\u003c\/p\u003e\n  \u003cp\u003eWith +100 fs²\/bounce of positive group delay dispersion, this mirror is intended for chirped-pulse amplification stretcher stages or upstream pulse engineering where controlled positive chirp is required, complementing downstream compressor optics.\u003c\/p\u003e\n\n  \u003ch3\u003eApplications\u003c\/h3\u003e\n  \u003cul\u003e\n    \u003cli\u003eCPA stretcher mirror replacement in pulse-stretching stages\u003c\/li\u003e\n    \u003cli\u003eRegenerative amplifier seeding pulse engineering\u003c\/li\u003e\n    \u003cli\u003eSub-nanosecond pulse stretching for chirped pulse amplification\u003c\/li\u003e\n    \u003cli\u003eSpectral phase pre-shaping for ultrafast amplifier chains\u003c\/li\u003e\n  \u003c\/ul\u003e\n\n  \u003ch3\u003eConstruction \u0026amp; Performance\u003c\/h3\u003e\n  \u003cp\u003eManufactured on a 25.4 mm diameter × 6.35 mm thick UVFS substrate with dielectric multilayer coating, \u003cem\u003eR\u0026gt;99.5%@700-1100nm\u003c\/em\u003e. The mirror operates at 5° angle of incidence with p- and s-polarization compatibility. The coating provides exceptional layer density, low absorption losses, and long-term spectral stability — characteristics required for dependable performance in fs-laser oscillator and amplifier chains.\u003c\/p\u003e\n  \u003cp\u003eThe 0.2 J\/cm² damage threshold (specified at 800nm) supports typical ultrafast laser fluences. Compatible with research-grade and industrial fs-laser systems requiring controlled dispersion at this operating wavelength.\u003c\/p\u003e\n\n  \u003ch3\u003eStorage \u0026amp; Handling\u003c\/h3\u003e\n  \u003cp\u003eOperate at 25 °C, 40–60% RH. Clean only with \u0026gt;99% optical-grade ethanol and lint-free lens tissue using single-pass drag method. Avoid abrasive cloths and water.\u003c\/p\u003e\n\u003c\/div\u003e\n","brand":"WaveQuanta","offers":[{"title":"Default Title","offer_id":47473871880346,"sku":"CM1512-25.4-6.35","price":2451.02,"currency_code":"SGD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0734\/6156\/3546\/files\/15_08235348465301147_350.png?v=1772511955"},{"product_id":"uv-chirped-mirror-100fs-2","title":"Broadband Chirped Mirror CM1512-50.8-12.7","description":"\u003cdiv\u003e\n  \u003ch3\u003eOverview\u003c\/h3\u003e\n  \u003cp\u003eThe \u003cstrong\u003eUV\/Visible Chirped Mirror 100fs²\u003c\/strong\u003e (\u003cstrong\u003eUltrafast Innovations CM1512\u003c\/strong\u003e) is a positive-dispersion (stretcher) dispersive mirror engineered for ultrafast laser dispersion management, providing +100 fs² of group delay dispersion per bounce across the 700–1100 nm operating bandwidth.\u003c\/p\u003e\n  \u003cp\u003eWith +100 fs²\/bounce of positive group delay dispersion, this mirror is intended for chirped-pulse amplification stretcher stages or upstream pulse engineering where controlled positive chirp is required, complementing downstream compressor optics.\u003c\/p\u003e\n\n  \u003ch3\u003eApplications\u003c\/h3\u003e\n  \u003cul\u003e\n    \u003cli\u003eCPA stretcher mirror replacement in pulse-stretching stages\u003c\/li\u003e\n    \u003cli\u003eRegenerative amplifier seeding pulse engineering\u003c\/li\u003e\n    \u003cli\u003eSub-nanosecond pulse stretching for chirped pulse amplification\u003c\/li\u003e\n    \u003cli\u003eSpectral phase pre-shaping for ultrafast amplifier chains\u003c\/li\u003e\n  \u003c\/ul\u003e\n\n  \u003ch3\u003eConstruction \u0026amp; Performance\u003c\/h3\u003e\n  \u003cp\u003eManufactured on a 50.8 mm diameter × 12.7 mm thick UVFS substrate with dielectric multilayer coating, \u003cem\u003eR\u0026gt;99.5%@700-1100nm\u003c\/em\u003e. The mirror operates at 5° angle of incidence with p- and s-polarization compatibility. The coating provides exceptional layer density, low absorption losses, and long-term spectral stability — characteristics required for dependable performance in fs-laser oscillator and amplifier chains.\u003c\/p\u003e\n  \u003cp\u003eThe 0.2 J\/cm² damage threshold (specified at 800nm) supports typical ultrafast laser fluences. Compatible with research-grade and industrial fs-laser systems requiring controlled dispersion at this operating wavelength.\u003c\/p\u003e\n\n  \u003ch3\u003eStorage \u0026amp; Handling\u003c\/h3\u003e\n  \u003cp\u003eOperate at 25 °C, 40–60% RH. Clean only with \u0026gt;99% optical-grade ethanol and lint-free lens tissue using single-pass drag method. Avoid abrasive cloths and water.\u003c\/p\u003e\n\u003c\/div\u003e\n","brand":"WaveQuanta","offers":[{"title":"Default Title","offer_id":47473871913114,"sku":"CM1512-50.8-12.7","price":3001.33,"currency_code":"SGD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0734\/6156\/3546\/files\/15_08235348468011012_350.png?v=1772511958"},{"product_id":"uv-chirped-mirror-100fs-4","title":"Broadband Chirped Mirror O-CPM-25.4-6.35-BL490","description":"\u003cdiv\u003e\n  \u003ch3\u003eOverview\u003c\/h3\u003e\n  \u003cp\u003eThe \u003cstrong\u003eUV\/Visible Chirped Mirror 100fs²\u003c\/strong\u003e (\u003cstrong\u003eUltrafast Innovations O\u003c\/strong\u003e) is a positive-dispersion (stretcher) dispersive mirror engineered for ultrafast laser dispersion management, providing +100 fs² of group delay dispersion per bounce across the 700–1100 nm operating bandwidth.\u003c\/p\u003e\n  \u003cp\u003eWith +100 fs²\/bounce of positive group delay dispersion, this mirror is intended for chirped-pulse amplification stretcher stages or upstream pulse engineering where controlled positive chirp is required, complementing downstream compressor optics.\u003c\/p\u003e\n\n  \u003ch3\u003eApplications\u003c\/h3\u003e\n  \u003cul\u003e\n    \u003cli\u003eCPA stretcher mirror replacement in pulse-stretching stages\u003c\/li\u003e\n    \u003cli\u003eRegenerative amplifier seeding pulse engineering\u003c\/li\u003e\n    \u003cli\u003eSub-nanosecond pulse stretching for chirped pulse amplification\u003c\/li\u003e\n    \u003cli\u003eSpectral phase pre-shaping for ultrafast amplifier chains\u003c\/li\u003e\n  \u003c\/ul\u003e\n\n  \u003ch3\u003eConstruction \u0026amp; Performance\u003c\/h3\u003e\n  \u003cp\u003eManufactured on a 25.4 mm diameter × 6.35 mm thick UVFS substrate with dielectric multilayer coating, \u003cem\u003eHR＞99.5%@700-1100nm\u003c\/em\u003e. The mirror operates at 5° angle of incidence with p- and s-polarization compatibility. The coating provides exceptional layer density, low absorption losses, and long-term spectral stability — characteristics required for dependable performance in fs-laser oscillator and amplifier chains.\u003c\/p\u003e\n  \u003cp\u003eThe 0.2 J\/cm² damage threshold (specified at 800nm) supports typical ultrafast laser fluences. Compatible with research-grade and industrial fs-laser systems requiring controlled dispersion at this operating wavelength.\u003c\/p\u003e\n\n  \u003ch3\u003eStorage \u0026amp; Handling\u003c\/h3\u003e\n  \u003cp\u003eOperate at 25 °C, 40–60% RH. Clean only with \u0026gt;99% optical-grade ethanol and lint-free lens tissue using single-pass drag method. Avoid abrasive cloths and water.\u003c\/p\u003e\n\u003c\/div\u003e\n","brand":"WaveQuanta","offers":[{"title":"Default Title","offer_id":47473872044186,"sku":"O-CPM-25.4-6.35-BL490","price":2451.02,"currency_code":"SGD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0734\/6156\/3546\/files\/15_08235348473472138_350.png?v=1772511962"},{"product_id":"uv-visible-chirped-mirror-100fs","title":"UV\/Visible Chirped Mirror -100fs²","description":"\u003cdiv\u003e\n  \u003ch3\u003eOverview\u003c\/h3\u003e\n  \u003cp\u003eThe \u003cstrong\u003eUV\/Visible Chirped Mirror -100fs²\u003c\/strong\u003e (\u003cstrong\u003eUltrafast Innovations CM2101\u003c\/strong\u003e) is a broadband dispersive mirror (BBDM) that provides -100 fs² of controlled negative group delay dispersion per bounce across the 750–1050 nm operating bandwidth, with a 900 nm center wavelength matched to Ti:Sapphire and broadband Cr-doped sources.\u003c\/p\u003e\n  \u003cp\u003eWith -100 fs²\/bounce, this mirror compensates the dispersion of several millimeters of fused silica or hundreds of millimeters of air per bounce, supporting sub-50 fs pulse compression schemes with manageable bounce counts. Engineered as a single-angle BBDM with optimized GDD flatness, it integrates cleanly into both intracavity and external compressor geometries without requiring matched-pair operation.\u003c\/p\u003e\n\n  \u003ch3\u003eApplications\u003c\/h3\u003e\n  \u003cul\u003e\n    \u003cli\u003eTi:Sapphire oscillator and amplifier intracavity dispersion management\u003c\/li\u003e\n    \u003cli\u003eSub-50 fs pulse compression for OPCPA front-end seeders\u003c\/li\u003e\n    \u003cli\u003eMulti-photon and two-photon fluorescence microscopy excitation lines\u003c\/li\u003e\n    \u003cli\u003eBroadband Cr:LiSAF \/ Cr:forsterite fs-laser compressor stages\u003c\/li\u003e\n  \u003c\/ul\u003e\n\n  \u003ch3\u003eConstruction \u0026amp; Performance\u003c\/h3\u003e\n  \u003cp\u003eManufactured on a 25.4 mm diameter × 6.35 mm thick UV fused silica (UVFS) substrate with dielectric multilayer coating, \u0026gt;99.9% reflectance specified as \u003cem\u003eR\u0026gt;99.9%@750-1050nm\u003c\/em\u003e. The mirror operates at 9° angle of incidence with p-polarized light. The dielectric coating delivers low absorption, high layer density, and long-term spectral stability — characteristics required for dependable performance in fs-laser oscillator and amplifier chains.\u003c\/p\u003e\n  \u003cp\u003eThe 0.2 J\/cm² damage threshold (specified at 800 nm) supports typical Ti:Sapphire oscillator and low-rep-rate amplifier fluences. Compatible laser systems include Ti:Sapphire oscillators (Coherent Mira, Spectra-Physics Tsunami), broadband fs amplifier seeders, and OPCPA pump line conditioning.\u003c\/p\u003e\n\n  \u003ch3\u003eStorage \u0026amp; Handling\u003c\/h3\u003e\n  \u003cp\u003eOperate at 25 °C, 40–60% RH. Clean only with \u0026gt;99% optical-grade ethanol and lint-free lens tissue using single-pass drag method. Avoid abrasive cloths and water.\u003c\/p\u003e\n\u003c\/div\u003e\n","brand":"WaveQuanta","offers":[{"title":"Default Title","offer_id":48003861741722,"sku":"CM2101-25.4-6.35","price":488.0,"currency_code":"SGD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0734\/6156\/3546\/files\/ufi-cmuvvis-cm2101-25-4-6-35-main.png?v=1778310350"},{"product_id":"uv-visible-chirped-mirror-268-278nm-116fs","title":"UV\/Visible Chirped Mirror 268-278nm -116fs²","description":"\u003cdiv\u003e\n  \u003ch3\u003eOverview\u003c\/h3\u003e\n  \u003cp\u003eThe \u003cstrong\u003eUV\/Visible Chirped Mirror 268-278nm -116fs²\u003c\/strong\u003e (\u003cstrong\u003eUltrafast Innovations CM1511\u003c\/strong\u003e) is a high-GDD dispersive mirror engineered for ultrafast laser dispersion management, providing -116 fs² of group delay dispersion per bounce across the 268–278 nm operating bandwidth.\u003c\/p\u003e\n  \u003cp\u003eWith -116 fs²\/bounce, this mirror provides substantial negative group delay dispersion per reflection — supporting compressor designs that balance ripple control against bounce count and footprint. The single-angle BBDM design integrates cleanly into both intracavity and external compressor geometries.\u003c\/p\u003e\n\n  \u003ch3\u003eApplications\u003c\/h3\u003e\n  \u003cul\u003e\n    \u003cli\u003eKBBF \/ KDP UV harmonic generation pulse-conditioning\u003c\/li\u003e\n    \u003cli\u003eDeep-UV pump-probe spectroscopy compressor stages\u003c\/li\u003e\n    \u003cli\u003eExcimer pre-pulse spectral shaping\u003c\/li\u003e\n    \u003cli\u003eFourth-harmonic Ti:Sapphire pulse management\u003c\/li\u003e\n  \u003c\/ul\u003e\n\n  \u003ch3\u003eConstruction \u0026amp; Performance\u003c\/h3\u003e\n  \u003cp\u003eManufactured on a 80 mm diameter × 20 mm thick UVFS substrate with dielectric multilayer coating, \u003cem\u003eR\u0026gt;80.0%@268-278nm\u003c\/em\u003e. The mirror operates at 5° angle of incidence with p- and s-polarization compatibility. The coating provides exceptional layer density, low absorption losses, and long-term spectral stability — characteristics required for dependable performance in fs-laser oscillator and amplifier chains.\u003c\/p\u003e\n\n  \u003ch3\u003eStorage \u0026amp; Handling\u003c\/h3\u003e\n  \u003cp\u003eOperate at 25 °C, 40–60% RH. Clean only with \u0026gt;99% optical-grade ethanol and lint-free lens tissue using single-pass drag method. Avoid abrasive cloths and water.\u003c\/p\u003e\n\u003c\/div\u003e\n","brand":"WaveQuanta","offers":[{"title":"Default Title","offer_id":48004599480474,"sku":"CM1511-80x20-20","price":879.0,"currency_code":"SGD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0734\/6156\/3546\/files\/ufi-cmuvvis-cm1511-80x20-20-main.png?v=1778314472"},{"product_id":"uv-visible-chirped-mirror-100fs-1","title":"UV\/Visible Chirped Mirror 100fs²","description":"\u003cdiv\u003e\n  \u003ch3\u003eOverview\u003c\/h3\u003e\n  \u003cp\u003eThe \u003cstrong\u003eUV\/Visible Chirped Mirror 100fs²\u003c\/strong\u003e (\u003cstrong\u003eUltrafast Innovations CM1512\u003c\/strong\u003e) is a positive-dispersion (stretcher) dispersive mirror engineered for ultrafast laser dispersion management, providing +100 fs² of group delay dispersion per bounce across the 700–1100 nm operating bandwidth.\u003c\/p\u003e\n  \u003cp\u003eWith +100 fs²\/bounce of positive group delay dispersion, this mirror is intended for chirped-pulse amplification stretcher stages or upstream pulse engineering where controlled positive chirp is required, complementing downstream compressor optics.\u003c\/p\u003e\n\n  \u003ch3\u003eApplications\u003c\/h3\u003e\n  \u003cul\u003e\n    \u003cli\u003eCPA stretcher mirror replacement in pulse-stretching stages\u003c\/li\u003e\n    \u003cli\u003eRegenerative amplifier seeding pulse engineering\u003c\/li\u003e\n    \u003cli\u003eSub-nanosecond pulse stretching for chirped pulse amplification\u003c\/li\u003e\n    \u003cli\u003eSpectral phase pre-shaping for ultrafast amplifier chains\u003c\/li\u003e\n  \u003c\/ul\u003e\n\n  \u003ch3\u003eConstruction \u0026amp; Performance\u003c\/h3\u003e\n  \u003cp\u003eManufactured on a 100 mm diameter × 25 mm thick UVFS substrate with dielectric multilayer coating, \u003cem\u003eR\u0026gt;99.5%@700-1100nm\u003c\/em\u003e. The mirror operates at 5° angle of incidence with p- and s-polarization compatibility. The coating provides exceptional layer density, low absorption losses, and long-term spectral stability — characteristics required for dependable performance in fs-laser oscillator and amplifier chains.\u003c\/p\u003e\n  \u003cp\u003eThe 0.2 J\/cm² damage threshold (specified at 800nm) supports typical ultrafast laser fluences. Compatible with research-grade and industrial fs-laser systems requiring controlled dispersion at this operating wavelength.\u003c\/p\u003e\n\n  \u003ch3\u003eStorage \u0026amp; Handling\u003c\/h3\u003e\n  \u003cp\u003eOperate at 25 °C, 40–60% RH. Clean only with \u0026gt;99% optical-grade ethanol and lint-free lens tissue using single-pass drag method. Avoid abrasive cloths and water.\u003c\/p\u003e\n\u003c\/div\u003e\n","brand":"WaveQuanta","offers":[{"title":"Default Title","offer_id":48004599513242,"sku":"CM1512-100-25","price":1673.0,"currency_code":"SGD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0734\/6156\/3546\/files\/ufi-cmuvvis-cm1512-100-25-main.png?v=1778314482"},{"product_id":"uv-visible-chirped-mirror-350-450nm-50fs","title":"UV\/Visible Chirped Mirror 350-450nm -50fs²","description":"\u003cdiv\u003e\n  \u003ch3\u003eOverview\u003c\/h3\u003e\n  \u003cp\u003eThe \u003cstrong\u003eUV\/Visible Chirped Mirror 350-450nm -50fs²\u003c\/strong\u003e (\u003cstrong\u003eUltrafast Innovations CM82\u003c\/strong\u003e) is a moderate-GDD dispersive mirror engineered for ultrafast laser dispersion management, providing -50 fs² of group delay dispersion per bounce across the 350–450 nm operating bandwidth.\u003c\/p\u003e\n  \u003cp\u003eWith -50 fs²\/bounce, this mirror provides moderate negative group delay dispersion per reflection — supporting compressor designs that balance ripple control against bounce count and footprint. The single-angle BBDM design integrates cleanly into both intracavity and external compressor geometries.\u003c\/p\u003e\n\n  \u003ch3\u003eApplications\u003c\/h3\u003e\n  \u003cul\u003e\n    \u003cli\u003eFrequency-doubled Ti:Sapphire dispersion management\u003c\/li\u003e\n    \u003cli\u003eBlue\/violet ultrafast laser compressor stages\u003c\/li\u003e\n    \u003cli\u003eFluorescence imaging at second-harmonic wavelengths\u003c\/li\u003e\n    \u003cli\u003eCr:Forsterite SHG pulse conditioning\u003c\/li\u003e\n  \u003c\/ul\u003e\n\n  \u003ch3\u003eConstruction \u0026amp; Performance\u003c\/h3\u003e\n  \u003cp\u003eManufactured on a 80 mm diameter × 20 mm thick UVFS substrate with dielectric multilayer coating, \u003cem\u003eR\u0026gt;99.0%@350-450nm\u003c\/em\u003e. The mirror operates at 5° angle of incidence with p-polarized light. The coating provides exceptional layer density, low absorption losses, and long-term spectral stability — characteristics required for dependable performance in fs-laser oscillator and amplifier chains.\u003c\/p\u003e\n\n  \u003ch3\u003eStorage \u0026amp; Handling\u003c\/h3\u003e\n  \u003cp\u003eOperate at 25 °C, 40–60% RH. Clean only with \u0026gt;99% optical-grade ethanol and lint-free lens tissue using single-pass drag method. Avoid abrasive cloths and water.\u003c\/p\u003e\n\u003c\/div\u003e\n","brand":"WaveQuanta","offers":[{"title":"Default Title","offer_id":48004599546010,"sku":"CM82-80x20-20","price":879.0,"currency_code":"SGD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0734\/6156\/3546\/files\/ufi-cmuvvis-cm82-80x20-20-main.png?v=1778314491"},{"product_id":"uv-visible-chirped-mirror-475-575nm-100fs","title":"UV\/Visible Chirped Mirror 475-575nm -100fs²","description":"\u003cdiv\u003e\n  \u003ch3\u003eOverview\u003c\/h3\u003e\n  \u003cp\u003eThe \u003cstrong\u003eUV\/Visible Chirped Mirror 475-575nm -100fs²\u003c\/strong\u003e (\u003cstrong\u003eUltrafast Innovations HD1820\u003c\/strong\u003e) is a moderate-GDD dispersive mirror engineered for ultrafast laser dispersion management, providing -100 fs² of group delay dispersion per bounce across the 475–575 nm operating bandwidth.\u003c\/p\u003e\n  \u003cp\u003eWith -100 fs²\/bounce, this mirror provides substantial negative group delay dispersion per reflection — supporting compressor designs that balance ripple control against bounce count and footprint. The single-angle BBDM design integrates cleanly into both intracavity and external compressor geometries.\u003c\/p\u003e\n\n  \u003ch3\u003eApplications\u003c\/h3\u003e\n  \u003cul\u003e\n    \u003cli\u003eFrequency-doubled Yb-band laser dispersion management\u003c\/li\u003e\n    \u003cli\u003eVisible ultrafast pulse compression for spectroscopy\u003c\/li\u003e\n    \u003cli\u003eMulti-color pump-probe experiments at SHG wavelengths\u003c\/li\u003e\n    \u003cli\u003eOPO and OPA visible idler pulse conditioning\u003c\/li\u003e\n  \u003c\/ul\u003e\n\n  \u003ch3\u003eConstruction \u0026amp; Performance\u003c\/h3\u003e\n  \u003cp\u003eManufactured on a 80 mm diameter × 20 mm thick UVFS substrate with dielectric multilayer coating, \u003cem\u003eR\u0026gt;99.8%@475-575nm\u003c\/em\u003e. The mirror operates at 5° angle of incidence with p-polarized light. The coating provides exceptional layer density, low absorption losses, and long-term spectral stability — characteristics required for dependable performance in fs-laser oscillator and amplifier chains.\u003c\/p\u003e\n\n  \u003ch3\u003eStorage \u0026amp; Handling\u003c\/h3\u003e\n  \u003cp\u003eOperate at 25 °C, 40–60% RH. Clean only with \u0026gt;99% optical-grade ethanol and lint-free lens tissue using single-pass drag method. Avoid abrasive cloths and water.\u003c\/p\u003e\n\u003c\/div\u003e\n","brand":"WaveQuanta","offers":[{"title":"Default Title","offer_id":48004605477018,"sku":"HD1820-80x20-20","price":976.0,"currency_code":"SGD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0734\/6156\/3546\/files\/ufi-cmuvvis-hd1820-80x20-20-main.png?v=1778314503"},{"product_id":"uv-visible-chirped-mirror-355-460nm-50fs","title":"UV\/Visible Chirped Mirror 355-460nm -50fs²","description":"\u003cdiv\u003e\n  \u003ch3\u003eOverview\u003c\/h3\u003e\n  \u003cp\u003eThe \u003cstrong\u003eUV\/Visible Chirped Mirror 355-460nm -50fs²\u003c\/strong\u003e (\u003cstrong\u003eUltrafast Innovations HD7203\u003c\/strong\u003e) is a moderate-GDD dispersive mirror engineered for ultrafast laser dispersion management, providing -50 fs² of group delay dispersion per bounce across the 355–460 nm operating bandwidth.\u003c\/p\u003e\n  \u003cp\u003eWith -50 fs²\/bounce, this mirror provides moderate negative group delay dispersion per reflection — supporting compressor designs that balance ripple control against bounce count and footprint. The single-angle BBDM design integrates cleanly into both intracavity and external compressor geometries.\u003c\/p\u003e\n\n  \u003ch3\u003eApplications\u003c\/h3\u003e\n  \u003cul\u003e\n    \u003cli\u003eFrequency-doubled Ti:Sapphire dispersion management\u003c\/li\u003e\n    \u003cli\u003eBlue\/violet ultrafast laser compressor stages\u003c\/li\u003e\n    \u003cli\u003eFluorescence imaging at second-harmonic wavelengths\u003c\/li\u003e\n    \u003cli\u003eCr:Forsterite SHG pulse conditioning\u003c\/li\u003e\n  \u003c\/ul\u003e\n\n  \u003ch3\u003eConstruction \u0026amp; Performance\u003c\/h3\u003e\n  \u003cp\u003eManufactured on a 80 mm diameter × 20 mm thick UVFS substrate with dielectric multilayer coating, \u003cem\u003eR\u0026gt;99.5%@355-460nm\u003c\/em\u003e. The mirror operates at 5° angle of incidence with p- and s-polarization compatibility. The coating provides exceptional layer density, low absorption losses, and long-term spectral stability — characteristics required for dependable performance in fs-laser oscillator and amplifier chains.\u003c\/p\u003e\n\n  \u003ch3\u003eStorage \u0026amp; Handling\u003c\/h3\u003e\n  \u003cp\u003eOperate at 25 °C, 40–60% RH. Clean only with \u0026gt;99% optical-grade ethanol and lint-free lens tissue using single-pass drag method. Avoid abrasive cloths and water.\u003c\/p\u003e\n\u003c\/div\u003e\n","brand":"WaveQuanta","offers":[{"title":"Default Title","offer_id":48004607803546,"sku":"HD7203-80x20-20","price":879.0,"currency_code":"SGD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0734\/6156\/3546\/files\/ufi-cmuvvis-hd7203-80x20-20-main.png?v=1778314516"},{"product_id":"uv-visible-chirped-mirror-100fs-2","title":"UV\/Visible Chirped Mirror 100fs²","description":"\u003cdiv\u003e\n  \u003ch3\u003eOverview\u003c\/h3\u003e\n  \u003cp\u003eThe \u003cstrong\u003eUV\/Visible Chirped Mirror 100fs²\u003c\/strong\u003e (\u003cstrong\u003eUltrafast Innovations PC1705\u003c\/strong\u003e) is a positive-dispersion (stretcher) dispersive mirror engineered for ultrafast laser dispersion management, providing +100 fs² of group delay dispersion per bounce across the 715–1250 nm operating bandwidth.\u003c\/p\u003e\n  \u003cp\u003eWith +100 fs²\/bounce of positive group delay dispersion, this mirror is intended for chirped-pulse amplification stretcher stages or upstream pulse engineering where controlled positive chirp is required, complementing downstream compressor optics.\u003c\/p\u003e\n\n  \u003ch3\u003eApplications\u003c\/h3\u003e\n  \u003cul\u003e\n    \u003cli\u003eCPA stretcher mirror replacement in pulse-stretching stages\u003c\/li\u003e\n    \u003cli\u003eRegenerative amplifier seeding pulse engineering\u003c\/li\u003e\n    \u003cli\u003eSub-nanosecond pulse stretching for chirped pulse amplification\u003c\/li\u003e\n    \u003cli\u003eSpectral phase pre-shaping for ultrafast amplifier chains\u003c\/li\u003e\n  \u003c\/ul\u003e\n\n  \u003ch3\u003eConstruction \u0026amp; Performance\u003c\/h3\u003e\n  \u003cp\u003eManufactured on a 100 mm diameter × 25 mm thick UVFS substrate with dielectric multilayer coating, \u003cem\u003eR\u0026gt;99.7%@715-1250nm\u003c\/em\u003e. The mirror operates at 5° angle of incidence with p-polarized light. The coating provides exceptional layer density, low absorption losses, and long-term spectral stability — characteristics required for dependable performance in fs-laser oscillator and amplifier chains.\u003c\/p\u003e\n  \u003cp\u003eThe 0.2 J\/cm² damage threshold (specified at 800nm) supports typical ultrafast laser fluences. Compatible with research-grade and industrial fs-laser systems requiring controlled dispersion at this operating wavelength.\u003c\/p\u003e\n\n  \u003ch3\u003eStorage \u0026amp; Handling\u003c\/h3\u003e\n  \u003cp\u003eOperate at 25 °C, 40–60% RH. Clean only with \u0026gt;99% optical-grade ethanol and lint-free lens tissue using single-pass drag method. Avoid abrasive cloths and water.\u003c\/p\u003e\n\u003c\/div\u003e\n","brand":"WaveQuanta","offers":[{"title":"Default Title","offer_id":48004607836314,"sku":"PC1705-L-100-25","price":1673.0,"currency_code":"SGD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0734\/6156\/3546\/files\/ufi-cmuvvis-pc1705-l-100-25-main.png?v=1778314529"},{"product_id":"uv-visible-chirped-mirror-100fs-3","title":"UV\/Visible Chirped Mirror 100fs²","description":"\u003cdiv\u003e\n  \u003ch3\u003eOverview\u003c\/h3\u003e\n  \u003cp\u003eThe \u003cstrong\u003eUV\/Visible Chirped Mirror 100fs²\u003c\/strong\u003e (\u003cstrong\u003eUltrafast Innovations PC1705\u003c\/strong\u003e) is a positive-dispersion (stretcher) dispersive mirror engineered for ultrafast laser dispersion management, providing +100 fs² of group delay dispersion per bounce across the 715–1250 nm operating bandwidth.\u003c\/p\u003e\n  \u003cp\u003eWith +100 fs²\/bounce of positive group delay dispersion, this mirror is intended for chirped-pulse amplification stretcher stages or upstream pulse engineering where controlled positive chirp is required, complementing downstream compressor optics.\u003c\/p\u003e\n\n  \u003ch3\u003eApplications\u003c\/h3\u003e\n  \u003cul\u003e\n    \u003cli\u003eCPA stretcher mirror replacement in pulse-stretching stages\u003c\/li\u003e\n    \u003cli\u003eRegenerative amplifier seeding pulse engineering\u003c\/li\u003e\n    \u003cli\u003eSub-nanosecond pulse stretching for chirped pulse amplification\u003c\/li\u003e\n    \u003cli\u003eSpectral phase pre-shaping for ultrafast amplifier chains\u003c\/li\u003e\n  \u003c\/ul\u003e\n\n  \u003ch3\u003eConstruction \u0026amp; Performance\u003c\/h3\u003e\n  \u003cp\u003eManufactured on a 25.4 mm diameter × 6.35 mm thick UVFS substrate with dielectric multilayer coating, \u003cem\u003eR\u0026gt;99.7%@715-1250nm\u003c\/em\u003e. The mirror operates at 5° angle of incidence with p-polarized light. The coating provides exceptional layer density, low absorption losses, and long-term spectral stability — characteristics required for dependable performance in fs-laser oscillator and amplifier chains.\u003c\/p\u003e\n  \u003cp\u003eThe 0.2 J\/cm² damage threshold (specified at 800nm) supports typical ultrafast laser fluences. Compatible with research-grade and industrial fs-laser systems requiring controlled dispersion at this operating wavelength.\u003c\/p\u003e\n\n  \u003ch3\u003eStorage \u0026amp; Handling\u003c\/h3\u003e\n  \u003cp\u003eOperate at 25 °C, 40–60% RH. Clean only with \u0026gt;99% optical-grade ethanol and lint-free lens tissue using single-pass drag method. Avoid abrasive cloths and water.\u003c\/p\u003e\n\u003c\/div\u003e\n","brand":"WaveQuanta","offers":[{"title":"Default Title","offer_id":48004607869082,"sku":"PC1705-L-25.4-6.35","price":683.0,"currency_code":"SGD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0734\/6156\/3546\/files\/ufi-cmuvvis-pc1705-l-25-4-6-35-main.png?v=1778314541"},{"product_id":"uv-visible-chirped-mirror-100fs-4","title":"UV\/Visible Chirped Mirror 100fs²","description":"\u003cdiv\u003e\n  \u003ch3\u003eOverview\u003c\/h3\u003e\n  \u003cp\u003eThe \u003cstrong\u003eUV\/Visible Chirped Mirror 100fs²\u003c\/strong\u003e (\u003cstrong\u003eUltrafast Innovations PC1705\u003c\/strong\u003e) is a positive-dispersion (stretcher) dispersive mirror engineered for ultrafast laser dispersion management, providing +100 fs² of group delay dispersion per bounce across the 715–1250 nm operating bandwidth.\u003c\/p\u003e\n  \u003cp\u003eWith +100 fs²\/bounce of positive group delay dispersion, this mirror is intended for chirped-pulse amplification stretcher stages or upstream pulse engineering where controlled positive chirp is required, complementing downstream compressor optics.\u003c\/p\u003e\n\n  \u003ch3\u003eApplications\u003c\/h3\u003e\n  \u003cul\u003e\n    \u003cli\u003eCPA stretcher mirror replacement in pulse-stretching stages\u003c\/li\u003e\n    \u003cli\u003eRegenerative amplifier seeding pulse engineering\u003c\/li\u003e\n    \u003cli\u003eSub-nanosecond pulse stretching for chirped pulse amplification\u003c\/li\u003e\n    \u003cli\u003eSpectral phase pre-shaping for ultrafast amplifier chains\u003c\/li\u003e\n  \u003c\/ul\u003e\n\n  \u003ch3\u003eConstruction \u0026amp; Performance\u003c\/h3\u003e\n  \u003cp\u003eManufactured on a 50.8 mm diameter × 12.7 mm thick UVFS substrate with dielectric multilayer coating, \u003cem\u003eR\u0026gt;99.7%@715-1250nm\u003c\/em\u003e. The mirror operates at 5° angle of incidence with p-polarized light. The coating provides exceptional layer density, low absorption losses, and long-term spectral stability — characteristics required for dependable performance in fs-laser oscillator and amplifier chains.\u003c\/p\u003e\n  \u003cp\u003eThe 0.2 J\/cm² damage threshold (specified at 800nm) supports typical ultrafast laser fluences. Compatible with research-grade and industrial fs-laser systems requiring controlled dispersion at this operating wavelength.\u003c\/p\u003e\n\n  \u003ch3\u003eStorage \u0026amp; Handling\u003c\/h3\u003e\n  \u003cp\u003eOperate at 25 °C, 40–60% RH. Clean only with \u0026gt;99% optical-grade ethanol and lint-free lens tissue using single-pass drag method. Avoid abrasive cloths and water.\u003c\/p\u003e\n\u003c\/div\u003e\n","brand":"WaveQuanta","offers":[{"title":"Default Title","offer_id":48004607901850,"sku":"PC1705-L-50.8-12.7","price":1171.0,"currency_code":"SGD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0734\/6156\/3546\/files\/ufi-cmuvvis-pc1705-l-50-8-12-7-main.png?v=1778314553"},{"product_id":"uv-visible-chirped-mirror-100fs-5","title":"UV\/Visible Chirped Mirror 100fs²","description":"\u003cdiv\u003e\n  \u003ch3\u003eOverview\u003c\/h3\u003e\n  \u003cp\u003eThe \u003cstrong\u003eUV\/Visible Chirped Mirror 100fs²\u003c\/strong\u003e (\u003cstrong\u003eUltrafast Innovations PC1705\u003c\/strong\u003e) is a positive-dispersion (stretcher) dispersive mirror engineered for ultrafast laser dispersion management, providing +100 fs² of group delay dispersion per bounce across the 715–1250 nm operating bandwidth.\u003c\/p\u003e\n  \u003cp\u003eWith +100 fs²\/bounce of positive group delay dispersion, this mirror is intended for chirped-pulse amplification stretcher stages or upstream pulse engineering where controlled positive chirp is required, complementing downstream compressor optics.\u003c\/p\u003e\n\n  \u003ch3\u003eApplications\u003c\/h3\u003e\n  \u003cul\u003e\n    \u003cli\u003eCPA stretcher mirror replacement in pulse-stretching stages\u003c\/li\u003e\n    \u003cli\u003eRegenerative amplifier seeding pulse engineering\u003c\/li\u003e\n    \u003cli\u003eSub-nanosecond pulse stretching for chirped pulse amplification\u003c\/li\u003e\n    \u003cli\u003eSpectral phase pre-shaping for ultrafast amplifier chains\u003c\/li\u003e\n  \u003c\/ul\u003e\n\n  \u003ch3\u003eConstruction \u0026amp; Performance\u003c\/h3\u003e\n  \u003cp\u003eManufactured on a 100 mm diameter × 25 mm thick UVFS substrate with dielectric multilayer coating, \u003cem\u003eR\u0026gt;99.7%@715-1250nm\u003c\/em\u003e. The mirror operates at 5° angle of incidence with p-polarized light. The coating provides exceptional layer density, low absorption losses, and long-term spectral stability — characteristics required for dependable performance in fs-laser oscillator and amplifier chains.\u003c\/p\u003e\n  \u003cp\u003eThe 0.2 J\/cm² damage threshold (specified at 800nm) supports typical ultrafast laser fluences. Compatible with research-grade and industrial fs-laser systems requiring controlled dispersion at this operating wavelength.\u003c\/p\u003e\n\n  \u003ch3\u003eStorage \u0026amp; Handling\u003c\/h3\u003e\n  \u003cp\u003eOperate at 25 °C, 40–60% RH. Clean only with \u0026gt;99% optical-grade ethanol and lint-free lens tissue using single-pass drag method. Avoid abrasive cloths and water.\u003c\/p\u003e\n\u003c\/div\u003e\n","brand":"WaveQuanta","offers":[{"title":"Default Title","offer_id":48004613996698,"sku":"PC1705-S-100-25","price":1673.0,"currency_code":"SGD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0734\/6156\/3546\/files\/ufi-cmuvvis-pc1705-s-100-25-main.png?v=1778314566"},{"product_id":"uv-visible-chirped-mirror-100fs-6","title":"UV\/Visible Chirped Mirror 100fs²","description":"\u003cdiv\u003e\n  \u003ch3\u003eOverview\u003c\/h3\u003e\n  \u003cp\u003eThe \u003cstrong\u003eUV\/Visible Chirped Mirror 100fs²\u003c\/strong\u003e (\u003cstrong\u003eUltrafast Innovations PC1705\u003c\/strong\u003e) is a positive-dispersion (stretcher) dispersive mirror engineered for ultrafast laser dispersion management, providing +100 fs² of group delay dispersion per bounce across the 715–1250 nm operating bandwidth.\u003c\/p\u003e\n  \u003cp\u003eWith +100 fs²\/bounce of positive group delay dispersion, this mirror is intended for chirped-pulse amplification stretcher stages or upstream pulse engineering where controlled positive chirp is required, complementing downstream compressor optics.\u003c\/p\u003e\n\n  \u003ch3\u003eApplications\u003c\/h3\u003e\n  \u003cul\u003e\n    \u003cli\u003eCPA stretcher mirror replacement in pulse-stretching stages\u003c\/li\u003e\n    \u003cli\u003eRegenerative amplifier seeding pulse engineering\u003c\/li\u003e\n    \u003cli\u003eSub-nanosecond pulse stretching for chirped pulse amplification\u003c\/li\u003e\n    \u003cli\u003eSpectral phase pre-shaping for ultrafast amplifier chains\u003c\/li\u003e\n  \u003c\/ul\u003e\n\n  \u003ch3\u003eConstruction \u0026amp; Performance\u003c\/h3\u003e\n  \u003cp\u003eManufactured on a 25.4 mm diameter × 6.35 mm thick UVFS substrate with dielectric multilayer coating, \u003cem\u003eR\u0026gt;99.7%@715-1250nm\u003c\/em\u003e. The mirror operates at 5° angle of incidence with p-polarized light. The coating provides exceptional layer density, low absorption losses, and long-term spectral stability — characteristics required for dependable performance in fs-laser oscillator and amplifier chains.\u003c\/p\u003e\n  \u003cp\u003eThe 0.2 J\/cm² damage threshold (specified at 800nm) supports typical ultrafast laser fluences. Compatible with research-grade and industrial fs-laser systems requiring controlled dispersion at this operating wavelength.\u003c\/p\u003e\n\n  \u003ch3\u003eStorage \u0026amp; Handling\u003c\/h3\u003e\n  \u003cp\u003eOperate at 25 °C, 40–60% RH. Clean only with \u0026gt;99% optical-grade ethanol and lint-free lens tissue using single-pass drag method. Avoid abrasive cloths and water.\u003c\/p\u003e\n\u003c\/div\u003e\n","brand":"WaveQuanta","offers":[{"title":"Default Title","offer_id":48004616355994,"sku":"PC1705-S-25.4-6.35","price":683.0,"currency_code":"SGD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0734\/6156\/3546\/files\/ufi-cmuvvis-pc1705-s-25-4-6-35-main.png?v=1778314578"},{"product_id":"uv-visible-chirped-mirror-100fs-7","title":"UV\/Visible Chirped Mirror 100fs²","description":"\u003cdiv\u003e\n  \u003ch3\u003eOverview\u003c\/h3\u003e\n  \u003cp\u003eThe \u003cstrong\u003eUV\/Visible Chirped Mirror 100fs²\u003c\/strong\u003e (\u003cstrong\u003eUltrafast Innovations PC1705\u003c\/strong\u003e) is a positive-dispersion (stretcher) dispersive mirror engineered for ultrafast laser dispersion management, providing +100 fs² of group delay dispersion per bounce across the 715–1250 nm operating bandwidth.\u003c\/p\u003e\n  \u003cp\u003eWith +100 fs²\/bounce of positive group delay dispersion, this mirror is intended for chirped-pulse amplification stretcher stages or upstream pulse engineering where controlled positive chirp is required, complementing downstream compressor optics.\u003c\/p\u003e\n\n  \u003ch3\u003eApplications\u003c\/h3\u003e\n  \u003cul\u003e\n    \u003cli\u003eCPA stretcher mirror replacement in pulse-stretching stages\u003c\/li\u003e\n    \u003cli\u003eRegenerative amplifier seeding pulse engineering\u003c\/li\u003e\n    \u003cli\u003eSub-nanosecond pulse stretching for chirped pulse amplification\u003c\/li\u003e\n    \u003cli\u003eSpectral phase pre-shaping for ultrafast amplifier chains\u003c\/li\u003e\n  \u003c\/ul\u003e\n\n  \u003ch3\u003eConstruction \u0026amp; Performance\u003c\/h3\u003e\n  \u003cp\u003eManufactured on a 50.8 mm diameter × 12.7 mm thick UVFS substrate with dielectric multilayer coating, \u003cem\u003eR\u0026gt;99.7%@715-1250nm\u003c\/em\u003e. The mirror operates at 5° angle of incidence with p-polarized light. The coating provides exceptional layer density, low absorption losses, and long-term spectral stability — characteristics required for dependable performance in fs-laser oscillator and amplifier chains.\u003c\/p\u003e\n  \u003cp\u003eThe 0.2 J\/cm² damage threshold (specified at 800nm) supports typical ultrafast laser fluences. Compatible with research-grade and industrial fs-laser systems requiring controlled dispersion at this operating wavelength.\u003c\/p\u003e\n\n  \u003ch3\u003eStorage \u0026amp; Handling\u003c\/h3\u003e\n  \u003cp\u003eOperate at 25 °C, 40–60% RH. Clean only with \u0026gt;99% optical-grade ethanol and lint-free lens tissue using single-pass drag method. Avoid abrasive cloths and water.\u003c\/p\u003e\n\u003c\/div\u003e\n","brand":"WaveQuanta","offers":[{"title":"Default Title","offer_id":48004616388762,"sku":"PC1705-S-50.8-12.7","price":1171.0,"currency_code":"SGD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0734\/6156\/3546\/files\/ufi-cmuvvis-pc1705-s-50-8-12-7-main.png?v=1778314591"},{"product_id":"uv-visible-chirped-mirror-25fs","title":"UV\/Visible Chirped Mirror -25fs²","description":"\u003cdiv\u003e\n  \u003ch3\u003eOverview\u003c\/h3\u003e\n  \u003cp\u003eThe \u003cstrong\u003eUV\/Visible Chirped Mirror -25fs²\u003c\/strong\u003e (\u003cstrong\u003eOptoman PCV\u003c\/strong\u003e) is a low-GDD dispersive mirror engineered for ultrafast laser dispersion management, providing -25 fs² of group delay dispersion per bounce across the 980–1080 nm operating bandwidth.\u003c\/p\u003e\n  \u003cp\u003eWith -25 fs²\/bounce, this mirror provides fine-tuning negative group delay dispersion per reflection — supporting compressor designs that balance ripple control against bounce count and footprint. The single-angle BBDM design integrates cleanly into both intracavity and external compressor geometries.\u003c\/p\u003e\n\n  \u003ch3\u003eApplications\u003c\/h3\u003e\n  \u003cul\u003e\n    \u003cli\u003eYb:YAG and Yb:KGW oscillator dispersion management\u003c\/li\u003e\n    \u003cli\u003eYb:fiber CPA stretcher-compressor matching\u003c\/li\u003e\n    \u003cli\u003eYb-band amplifier post-compression at 1030 nm\u003c\/li\u003e\n    \u003cli\u003eIndustrial fs-laser dispersion control for materials processing\u003c\/li\u003e\n  \u003c\/ul\u003e\n\n  \u003ch3\u003eConstruction \u0026amp; Performance\u003c\/h3\u003e\n  \u003cp\u003eManufactured on a 25.4 mm diameter × 6 mm thick UVFS substrate with ion beam sputtered (IBS) dielectric multilayer coating, \u003cem\u003eS1:HRsp_abs\u0026gt;99.9%@980 nm - 1080 nm \/ S2:Uncoated\u003c\/em\u003e. The mirror operates at 0–10° angle of incidence. The coating provides exceptional layer density, low absorption losses, and long-term spectral stability — characteristics required for dependable performance in fs-laser oscillator and amplifier chains.\u003c\/p\u003e\n  \u003cp\u003eThe 0.2 J\/cm² damage threshold (specified at 50 fs, S-on-1) supports typical ultrafast laser fluences. Compatible with research-grade and industrial fs-laser systems requiring controlled dispersion at this operating wavelength.\u003c\/p\u003e\n\n  \u003ch3\u003eStorage \u0026amp; Handling\u003c\/h3\u003e\n  \u003cp\u003eOperate at 25 °C, 40–60% RH. Clean only with \u0026gt;99% optical-grade ethanol and lint-free lens tissue using single-pass drag method. Avoid abrasive cloths and water.\u003c\/p\u003e\n\u003c\/div\u003e\n","brand":"WaveQuanta","offers":[{"title":"Default Title","offer_id":48004616421530,"sku":"PCV-R1500-UVFS-25.4-ET6.0-GTI1","price":625.0,"currency_code":"SGD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0734\/6156\/3546\/files\/ufi-cmuvvis-pcv-r1500-uvfs-25-4-et6-0-gti1-main.png?v=1778314603"}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0734\/6156\/3546\/collections\/a05ce3a46ae4f8a722eb0f76b30f3903.jpg?v=1777647400","url":"https:\/\/waveqvanta.com\/collections\/wq-uo-cm-uv-vis.oembed","provider":"WaveQuanta","version":"1.0","type":"link"}