{"product_id":"800nm-chirped-mirror-40fs-12","title":"800nm Chirped Mirror PC1334-80x20-20","description":"\u003cdiv\u003e\n  \u003ch3\u003eOverview\u003c\/h3\u003e\n  \u003cp\u003eThe \u003cstrong\u003e800nm Chirped Mirror -40fs²\u003c\/strong\u003e (PC1334-80x20-20) is a broadband dispersive mirror (BBDM) engineered for precise GDD compensation in Ti:Sapphire laser systems operating near 750nm center wavelength. Delivering -40 fs² of group delay dispersion per bounce across a 500–1000 nm spectral range, this P-polarized chirped mirror provides low-dispersion control ideal for sub-10 fs and few-cycle pulse compression in ultrafast oscillators and chirped pulse amplification (CPA) systems.\u003c\/p\u003e\n  \u003cp\u003eThe -40 fs² GDD value positions this mirror in the low-dispersion category, making it specifically suited for fine-tuning residual dispersion in pre-compressed laser chains or for applications requiring minimal group velocity dispersion (GVD) accumulation per reflection. With approximately 150 bounces needed to compensate 6000 fs² of positive dispersion, this mirror enables compact folded-path designs in Ti:Sapphire oscillator cavities and OPCPA pre-compression stages where space constraints and alignment stability are critical.\u003c\/p\u003e\n  \n  \u003ch3\u003eApplications\u003c\/h3\u003e\n  \u003cul\u003e\n    \u003cli\u003eTi:Sapphire oscillator intracavity dispersion management for sub-10 fs pulse generation at 750–850 nm\u003c\/li\u003e\n    \u003cli\u003eCPA stretcher\/compressor fine-tuning in femtosecond amplifier systems operating at 800 nm\u003c\/li\u003e\n    \u003cli\u003eOPCPA seed pulse compression and pre-compensation for broadband parametric amplification\u003c\/li\u003e\n    \u003cli\u003eOPA pump beam conditioning and temporal pulse shaping in visible-to-NIR nonlinear frequency conversion\u003c\/li\u003e\n  \u003c\/ul\u003e\n  \n  \u003ch3\u003eConstruction \u0026amp; Performance\u003c\/h3\u003e\n  \u003cp\u003eManufactured by Ultrafast Innovations (model PC1334_RC4), this 80.0 × 20.0 mm UVFS substrate features ion beam sputtered (IBS) multilayer coatings optimized for \u0026gt;98% reflectance across the full 500–1000 nm bandwidth. Designed for 5° angle of incidence with P-polarization, the mirror maintains excellent phase characteristics while achieving 0.2 J\/cm² laser-induced damage threshold for femtosecond pulses. The large 80 mm aperture accommodates expanded beam profiles typical in high-energy ultrafast systems.\u003c\/p\u003e\n  \n  \u003ch3\u003eStorage \u0026amp; Handling\u003c\/h3\u003e\n  \u003cp\u003eOperate at 25 °C, 40–60% RH. Clean only with \u0026gt;99% optical-grade ethanol and lint-free lens tissue using single-pass drag method. Avoid abrasive cloths and water.\u003c\/p\u003e\n\u003c\/div\u003e","brand":"Ultrafast Innovations","offers":[{"title":"Default Title","offer_id":47948106891418,"sku":"PC1334-80x20-20","price":1830.0,"currency_code":"SGD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0734\/6156\/3546\/files\/800nm-chirped-mirror-render_9c8c8860-93ed-4a2d-a5da-1ae947a36422.png?v=1777648108","url":"https:\/\/waveqvanta.com\/products\/800nm-chirped-mirror-40fs-12","provider":"WaveQuanta","version":"1.0","type":"link"}