Harmonic Beam Splitter HR1030nm HT515nm 0°

Overview

The Harmonic Beam Splitter HR1030nm HT515nm 0° (PP-UVFS-25.4-1.0-DM372-AR706) is a flat dichroic mirror engineered for spectral combining and separating in multi-line femtosecond optical systems. The double-coating design pairs high reflectance at the operating wavelength with high transmission at the complementary band — typically used in pump-probe, harmonic-cleanup, and OPA seed-pump combining geometries. Optimized for an angle of incidence of 0.0° at a center wavelength of 1030 nm, the UVFS substrate carries an IBS-deposited dielectric stack engineered for high reflectance, low scatter, and minimal group-delay distortion of femtosecond and picosecond pulses (Optoman batch reference: PAN6058).

The 25.4 mm diameter form factor integrates directly into modern Yb-band, Ti:Sapphire, and harmonic-conversion beam paths where damage-tolerant reflectors are required. The IBS coating route delivers consistent batch-to-batch performance and excellent environmental stability under temperature, humidity, and vacuum cycling.

Applications

• Yb:YAG / Yb:KGW thin-disk amplifiers
• industrial fs material processing
• Nd:YAG fundamental at 1064 nm
• fiber CPA compressors

Construction & Performance

Substrate: UVFS, polished to laser-grade surface quality. Coating: IBS multilayer dielectric, optimized for the 1030.0 nm design wavelength. Damage threshold: 0.2 J/cm² @100 fs, 1 kHz — sufficient for typical kHz-class femtosecond amplifier outputs. The mount-side rear face is fine-ground for non-marring contact in standard kinematic mounts.

Like all WaveQuanta ultrafast optics, this mirror ships matched to spec sheet, with reflectance and group-delay-dispersion measurements traceable to vendor batch records on request. Pair-matched sets and custom dimensions can be quoted on lead times of 4–8 weeks.

Storage & Handling

Store in original packaging at 25 °C and 40–60 % relative humidity. Clean only with high-purity (≥99 %) ethanol or acetone on lens-grade tissue using the drop-and-drag method. Avoid abrasive cloths, contact between the coating and any solid surface, and water-based cleaners; both can permanently damage the dielectric stack.