
High Power Homogenizing DOE DOE25Q-355-FTS38-6
DOE25Q-355-FTS38-6Design Tools
LBTek High-Power Homogenizing DOE is a diffractive optical element manufactured from UV-grade fused silica. The design employs point-to-point mapping calculations based on incident light specifications, lens focal length, and desired output parameters to introduce phase structures via surface relief processing that transform and homogenize Gaussian (TEM00, M2<1.3) incident light.
UV-grade fused silica offers low absorption and a high damage threshold, making it more compatible with ultraviolet wavelength applications. The resulting products demonstrate high uniformity, sharp edges, and high damage threshold, proving valuable across laser medical aesthetics, laser processing, and surface treatment applications.
Key Features
- UV-grade fused silica substrate with high damage threshold
- Output shapes: square, rectangular, circular, and linear flat-top profiles
- Wavelengths: 343 nm, 355 nm, 532 nm, 1030 nm, 1064 nm, 1080 nm
- Standard effective focal length: 100 mm
- Mounted in 1-inch mechanical housing with model engraving
- Flexible parameter customization available
| Component Material | UV fused silica |
| Incident spot diameter | 6 mm |
| Component size | 16×16 mm, installed in a Ø25.4×4 mm mechanical housing. |
| Incident beam quality | M2<1.3 |
| Clear Aperture | 15×15 mm |
| Position Tolerance | ±0.3 mm (±5% of the input beam diameter) |
| Operating Wavelength | 355 nm |
| Incident light tilt | ±5 ° |
| Surface Quality (Scratch/Dig) | 60/40 |
| Output beam shape | Square |
| Diffraction Efficiency | >97 % |
| Output beam spot size | 38×38 μm |
| Focal Spot Size | 3.77 μm |
| Unevenness (RMS) | <10 % |
| Diffraction efficiency (FWHM) | >90 % |
| Effective Focal Length (EFL) | 100 mm |