{"product_id":"ultra-fast-mirrors-ufpm10-a2-sp","title":"Ultrafast Mirror, UVFS, Diameter 25.4 mm, Operating Wavelength 460 nm-590 nm UFPM10-A2-SP","description":"\u003ch2\u003eUltrafast Mirror — Model UFPM10-A2-SP\u003c\/h2\u003e\n\u003cp\u003e\u003cem\u003eOperating wavelength 460 nm-590 nm, Ø25.4 mm, thickness 6 mm, substrate fused quartz.\u003c\/em\u003e\u003c\/p\u003e\n\u003ch3\u003eProduct Description\u003c\/h3\u003e\n\u003cul\u003e\n\u003cli\u003eLow Group Delay Dispersion Dielectric Coating, using Ion Beam Sputtering (IBS) Process\u003c\/li\u003e\n\u003cli\u003eWavelength range from 340 nm to 1700 nm\u003c\/li\u003e\n\u003cli\u003eLower Coefficient of Thermal Expansion and extremely high thermal shock stability\u003c\/li\u003e\n\u003cli\u003eSuitable for high-power femtosecond pulse lasers and imaging fields\u003c\/li\u003e\n\u003cli\u003eFor 45° incidence\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003cp\u003eThe substrate material of LBTEK ultrafast mirrors is fused silica, with a high-reflectance coating on the surface being a low group delay dispersion dielectric coating deposited using ion-beam sputtering (IBS). During the ion-beam sputtering process, a high-energy electric field accelerates the ion beam toward the target, causing ions to be sputtered from the target and releasing more ions, which ultimately deposit the coating on a rotating substrate. Using ion-beam sputtering enables high repeatability in batch coating and low coating layer thickness errors, thereby ensuring the corresponding design wavelength range and low group delay dispersion.\u003c\/p\u003e\n\u003cp\u003eFused silica has a lower coefficient of thermal expansion and extremely high thermal shock stability, making it particularly suitable for high-power femtosecond pulsed lasers and imaging applications. Note: The direction indicated by the arrow engraved on the side edge corresponds to the coated surface.\u003c\/p\u003e\n\u003ch3\u003eUltrafast Mirror\u003c\/h3\u003e\n\u003cul\u003e\n\u003cli\u003eWavelength range from 340 nm to 1700 nm\u003c\/li\u003e\n\u003cli\u003eCommonly used for optical path deflection\u003c\/li\u003e\n\u003cli\u003eSuitable for high-power femtosecond pulsed laser and image fields\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003cp\u003eLBTEK Ultrafast Mirrors are commonly used for optical path deflection. Fused Silica has a lower Coefficient of Thermal Expansion and extremely high thermal vibration stability, making Ultrafast Mirrors particularly suitable for high-power femtosecond pulse lasers and imaging applications. Additionally, LBTEK Ultrafast Mirrors meet the requirement of a 45° incidence angle for the beam, with reflectance exceeding 99%.\u003c\/p\u003e","brand":"WaveQuanta","offers":[{"title":"Default Title","offer_id":67984977789082,"sku":"UFPM10-A2-SP","price":235.45,"currency_code":"SGD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0734\/6156\/3546\/files\/1-1_E8_B6_85_E5_BF_AB_E5_8F_8D_E5_B0_84_E9_95_9C-FlJmS9sf19Io9YUv6fL2YmfTh4S8_5d63d2c1-5547-428e-8920-083a5617733c.jpg?v=1793165448","url":"https:\/\/waveqvanta.com\/products\/ultra-fast-mirrors-ufpm10-a2-sp","provider":"WaveQuanta","version":"1.0","type":"link"}