Application · Semiconductor Inspection

Semiconductor Optical Inspection

Optical modules for wafer inspection, package defect detection, thin-film metrology, and inline process monitoring.

Building or upgrading a wafer / package inspection system and unsure how to choose illumination, imaging optics, filters, and cameras to catch the defects that matter? WaveQuanta translates your defect spec into a manufacturable inspection optical module.

Step 2 — Confirm the problem

Common project challenges

If any of these sound familiar, you're in the right place. WaveQuanta engineers have seen — and solved — every one of them.

1

Illumination strategy: bright-field, dark-field, or both?

Each catches different defect types. Combination needed for general inspection.

2

Imaging magnification and NA

Smaller defects need higher NA, but limit FOV → throughput trade-off.

3

Filter and source matching

Source LED bandwidth × filter passband × camera sensitivity = real signal level.

4

Detecting weak defect signal

Low-contrast defects need shot-noise-limited detection and statistical processing.

5

Inline inspection throughput

Rastering + multi-channel + smart triggering for > 1 wafer / minute.

6

Modular / serviceable optical path

Field-replaceable filters and source modules for quick recipe changes.

7

Mechanical stage and integration

Sub-µm positioning over 300 mm wafer.

8

Calibration and reference standards

NIST-traceable standards for tool-to-tool consistency.

Step 3 — Understand the system

Typical system architecture

Most projects in this area follow a similar signal flow. Your specific architecture depends on resolution, throughput, and form-factor targets.

ILLUMINATION MODULE

DUV / UV / visible source + uniformity optics matched to defect contrast.

IMAGING OPTICS

Plan-apo objective with high NA + tube lens + intermediate optics.

OBJECTIVE LENS SELECTION

DUV-grade or visible-grade objective — NA, working distance, chromatic correction.

FILTER & WAVELENGTH SELECTION

Bandpass / longpass / dichroic — for spectral filtering and multi-channel separation.

INSPECTION CAMERA

Line-scan, area-scan sCMOS, or TDI camera — chosen for throughput.

Step 4 — Pick the modules

Recommended system modules

These are the building blocks. Each module is a category of products — pick the right brand and grade for your project stage below.

Step 5 — Match your project stage

Choose your project stage

Same modules, three configurations sized for where your project is today. Move up the tiers as you progress from research to validation to OEM.

Research Starter

Method development

Bench-mounted inspection optical engine for defect classification studies and recipe development.

  • Stock illumination (UV / visible LED)
  • Plan-apo objective NA 0.55
  • Manual XY stage
  • sCMOS area camera
  • Manual filter wheel

BOM tier: $50k – $150k

OEM Production

Inspection-tool OEM · 24/7

Productized inspection optical module for an inline tool. Locked BOM, SECS/GEM, full quality docs.

  • Sealed DUV illumination
  • Factory pre-aligned imaging
  • Line-scan TDI for high throughput
  • Integrated SECS/GEM
  • SEMI quality documentation
  • Long-term supply contract

BOM tier: $800k+ · contract pricing

Step 9 — Common questions

Frequently asked questions

Quick answers to the questions our application engineers hear most often.

Bright-field vs dark-field — when?

Bright-field: high contrast for absorbing defects (residue, contamination). Dark-field: catches scattering defects (particles, scratches) against a clean background. Most full-coverage inspection tools use both modes simultaneously.

DUV illumination for what defect size?

266 nm DUV: 50–100 nm defect detection on patterned wafers. 193 nm: 30–50 nm. Below 30 nm requires extreme-UV (EUV, 13.5 nm) — a different game (KLA / ASML domain).

Line-scan vs area camera?

Line-scan TDI: highest throughput, but requires synchronized stage motion. Standard for 24/7 inline inspection. Area sCMOS: easier integration, fixed-point inspection. Used for atline or research.

Photoluminescence imaging — what for?

PL imaging detects sub-surface defects in III-V (GaAs, InP), SiC, and GaN wafers. Used for epitaxial-layer quality, dislocation mapping, and stacking-fault detection. UV / blue excitation, NIR / visible PL emission.

How fast can inspection run?

Inline TDI tools: 1 wafer / 30 s (300 mm) for general defects. Atline: 1–5 minutes per wafer. Research: minutes to tens of minutes for full coverage.

How do you handle MTF / aberration over the full wafer?

Field-flattened tube lens, motorized auto-focus per die, and per-position calibration tables. Engineering Validation tier ships with full MTF characterization at multiple field positions.

Long-term supply for inspection tool OEM?

WaveQuanta partners with semiconductor inspection-tool OEMs on multi-year programs — locked BOM, batch-consistency reports, SEMI documentation, and dedicated FAE support.

Can WaveQuanta provide the full inspection recipe?

For Engineering Validation tier and above, we provide reference defect samples and recipe templates. Final defect-classification recipe is co-developed with your process engineering team.

Step 10 — Engineering Review

Application Engineering Review

Tell us your application, current setup, and project context. A WaveQuanta application engineer will return initial recommendations within 1 business day.

  1. 1 Application
  2. 2 Current setup
  3. 3 Project & purchase

Tell us your application

What you want to measure, in plain words. We'll translate to optics.

Your current setup

What do you already have? Skip any field that doesn't apply.

Project & purchase context

Helps us decide whether to scope a starter kit, a full engineering review, or an OEM design-in.