
High-power Laser Line Reflectors LPM10-532-HP
LPM10-532-HPDesign Tools
High-power Laser Line Reflectors — Model LPM10-532-HP
Operating wavelength 532 nm, Ø25.4 mm, substrate UV Fused Silica.
Product Description
- High-purity UV Fused Silica Fabrication
- Ultra-high Laser-induced Damage Threshold Dielectric Coating
- High Reflectivity
The LBTEK high-power laser line mirrors are manufactured using high-purity UV fused silica and ultra-high laser-induced damage threshold (LIDT) dielectric coatings, capable of withstanding high-energy pulses with superior damage thresholds. The LBTEK high-power laser line mirrors are highly efficient reflectors optimized for single-wavelength ranges. The UV fused silica substrate of LBTEK high-power laser line mirrors offers better uniformity and lower thermal expansion coefficients, ensuring superior performance under temperature fluctuations and enhanced resistance to environmental impacts. The LBTEK high-power laser line mirrors are available in seven working wavelengths: 266 nm, 355 nm, 532 nm, 780 nm, 1064 nm, 1550 nm, and a dual-wavelength option of 532 & 1064 nm, with an incident angle range of 0-45° and reflectivity exceeding 99%.
High-power Laser Line Reflectors
- Design Wavelength: 266 nm, 355 nm, 532 nm, 780 nm, 1064 nm, and 1550 nm Optional
- High Damage Threshold
- High Reflectivity
Address:Building A6, Huanchuang Enterprise Plaza, Yuelu Idstrict, Changsha
| Clear Aperture | >90%CA |
| Thickness | 6 mm |
| Damage Threshold | 0.1355J/cm2@515 nm, 290 fs, 20 kHz, Ø12.07μm (Single Pulse); 0.0568J/cm2@515 nm, 290 fs, 100 Hz, Ø12.07μm (100 Pulses); 8J/cm2, 532 nm, 10 ns, 20 Hz |
| Reflectance (AR) | Rs, Rp>99%a@532 nm |
| Diameter Tolerance | +0.0/-0.25 mm |
| Thickness Tolerance | ±0.25 mm |
| Clear Aperture | >90%CA |
| Operating Wavelength | 532 nm |
| Reflectance | Rs, Rp>99%a@532 nm |
| Thickness | 6 mm |
| Diameter | 25.4 mm |
| Substrate Material | UV fused silica |
| Damage Threshold | 0.1355J/cm2@515 nm, 290 fs, 20 kHz, Ø12.07μm (Single Pulse); 0.0568J/cm2@515 nm, 290 fs, 100 Hz, Ø12.07μm (100 Pulses); 8J/cm2, 532 nm, 10 ns, 20 Hz |





