
Ultrafast Mirror, UVFS, Diameter 12.7 mm, Working Wavelength 460 nm-590 nm UFPM05-A2-SP
UFPM05-A2-SPDesign Tools
Ultrafast Mirror — Model UFPM05-A2-SP
Operating wavelength 460 nm-590 nm, Ø12.7 mm, thickness 6 mm, substrate fused quartz.
Product Description
- Low Group Delay Dispersion Dielectric Coating, using Ion Beam Sputtering (IBS) Process
- Wavelength range from 340 nm to 1700 nm
- Lower Coefficient of Thermal Expansion and extremely high thermal shock stability
- Suitable for high-power femtosecond pulse lasers and imaging fields
- For 45° incidence
The substrate material of LBTEK ultrafast mirrors is fused silica, with a high-reflectance coating on the surface being a low group delay dispersion dielectric coating deposited using ion-beam sputtering (IBS). During the ion-beam sputtering process, a high-energy electric field accelerates the ion beam toward the target, causing ions to be sputtered from the target and releasing more ions, which ultimately deposit the coating on a rotating substrate. Using ion-beam sputtering enables high repeatability in batch coating and low coating layer thickness errors, thereby ensuring the corresponding design wavelength range and low group delay dispersion.
Fused silica has a lower coefficient of thermal expansion and extremely high thermal shock stability, making it particularly suitable for high-power femtosecond pulsed lasers and imaging applications. Note: The direction indicated by the arrow engraved on the side edge corresponds to the coated surface.
Ultrafast Mirror
- Wavelength range from 340 nm to 1700 nm
- Commonly used for optical path deflection
- Suitable for high-power femtosecond pulsed laser and image fields
LBTEK Ultrafast Mirrors are commonly used for optical path deflection. Fused Silica has a lower Coefficient of Thermal Expansion and extremely high thermal vibration stability, making Ultrafast Mirrors particularly suitable for high-power femtosecond pulse lasers and imaging applications. Additionally, LBTEK Ultrafast Mirrors meet the requirement of a 45° incidence angle for the beam, with reflectance exceeding 99%.
| Operating Wavelength | 460 nm-590 nm |
| Material | fused quartz |
| Diameter | 12.7 mm |
| Diameter Tolerance | +0.0/-0.1 mm |
| Thickness | 6 mm |
| Thickness Tolerance | ±0.1 mm |
| Clear Aperture | >90%CA |
| Coating | Low Group Delay Dispersion Dielectric Thin Film |
| Reflectivity | Rs>99%@460-590 nm, Rp>99%@480-560 nm(45°AOI) |
| Surface Quality (Scratch/Dig) | 20/10 |
| Surface Parallelism | <3 arcmin |
| Flatness (@633 nm) | λ/10 |
| Group Delay Dispersion | |GDDs|<30 fs²@460-590 nm, |GDDs|<30 fs²@480-560 nm |
| Backside Processing | Frosted |





