800nm Chirped Mirror F1402-RC2-38.1-12.7

Overview

The F1402-RC2 800nm Chirped Mirror is a specialized beam-splitting optic designed for 75° angle of incidence operation in Ti:Sapphire laser systems. Optimized for 775 nm center wavelength with a broad 650–900 nm spectral range, this chirped mirror delivers >90% reflectance for S-polarized light while functioning as a beam splitter in chirped pulse amplification (CPA) and OPCPA configurations. The 38.1 mm diameter UVFS substrate provides exceptional thermal stability and optical homogeneity for ultrafast pulse manipulation.

This optic's 75° AOI geometry makes it uniquely suited for compact folded cavity designs and off-axis beam routing in amplifier chains where precise GVD management and beam splitting must occur simultaneously. The S-polarization specificity ensures predictable dispersion characteristics in polarization-multiplexed systems and prevents unwanted phase distortions common in P-pol configurations at high incidence angles.

Applications

• Ti:Sapphire Amplifier Beam Routing: Intracavity beam splitting with simultaneous GDD compensation in regenerative and multipass CPA systems operating at 800 nm
• OPCPA Pump-Signal Separation: High-angle beam splitting for separating pump and signal beams in optical parametric chirped pulse amplification architectures
• Dual-Function Dispersion Management: Combined beam extraction and group delay dispersion control in compact oscillator-amplifier interfaces
• OPA Pumping Geometries: Non-collinear phase-matching configurations requiring polarization-selective beam splitting with broadband 650–900 nm coverage

Construction & Performance

Manufactured by Ultrafast Innovations on a 12.7 mm thick UVFS substrate, this 775nm chirped mirror features ion beam sputtered (IBS) multilayer dielectric coatings engineered for R>90% across the entire 650–900 nm bandwidth. The 75° angle of incidence design with S-polarization selectivity enables 90% reflectance beam splitting while maintaining controlled dispersion properties. With a laser-induced damage threshold of 0.2 J/cm² for femtosecond pulses, this optic handles the peak intensities typical of kilohertz repetition-rate amplified Ti:Sapphire systems.

Storage & Handling

Operate at 25 °C, 40–60% RH. Clean only with >99% optical-grade ethanol and lint-free lens tissue using single-pass drag method. Avoid abrasive cloths and water.