800nm Chirped Mirror HD2222-25.4-6.35

Overview

The 800nm Chirped Mirror -150fs² (Ultrafast Innovations HD2222, 25.4mm diameter) delivers precise negative group delay dispersion (GDD) of -150 fs² per bounce across the 700–900 nm wavelength range, optimized for Ti:Sapphire laser systems operating at 800nm. This moderate GDD value enables fine-tuned dispersion compensation in chirped pulse amplification (CPA) systems and ultrafast oscillators where sub-100 femtosecond pulse durations are required.

With -150 fs² per reflection, this 800nm chirped mirror provides practical bounce counts for typical cavity designs: compensating 3000 fs² of positive GVD requires only 20 bounces, while 6000 fs² compensation needs 40 bounces. This GDD magnitude strikes an optimal balance between compact optical layouts and sufficient dispersion control authority, avoiding the unwanted higher-order dispersion that accumulates with excessive bounce counts on more aggressive chirped mirror designs.

Applications

• Ti:Sapphire oscillator intracavity dispersion management – fine compensation of gain medium and air path GVD for sub-30 fs pulse generation
• CPA stretcher/compressor optimization – residual dispersion correction in regenerative and multipass amplifier architectures at 800nm
• OPCPA pump line conditioning – temporal pulse shaping for Ti:Sapphire pump lasers driving optical parametric chirped pulse amplification systems
• External compression stages – post-amplifier GDD compensation without transmission losses or spatial chirp from prism/grating compressors

Construction & Performance

Ion beam sputtered (IBS) multilayer dielectric coating on UV-fused silica (UVFS) substrate delivers >99% reflectance across the full 700–900 nm bandwidth. P-polarization optimized at 5° angle of incidence (AOI) ensures maximum reflectivity and minimal phase distortion. The 6.35mm thickness provides excellent mechanical stability while maintaining thermal dissipation capability for 0.2 J/cm² laser-induced damage threshold with femtosecond pulses. UVFS substrate exhibits negligible bulk dispersion and superior thermal shock resistance for demanding ultrafast laser environments.

Storage & Handling

Operate at 25 °C, 40–60% RH. Clean only with >99% optical-grade ethanol and lint-free lens tissue using single-pass drag method. Avoid abrasive cloths and water.