800nm Chirped Mirror HD58-25.4-6.35

Overview

The 800nm Chirped Mirror -275fs² (Ultrafast Innovations HD58) delivers mid-range negative group delay dispersion for Ti:Sapphire laser systems operating between 690–880 nm. With a GDD of -275 fs² per bounce at 785nm chirped mirror wavelength, this high-dispersion mirror enables efficient pulse compression and GDD compensation in chirped pulse amplification (CPA) systems and external compressor configurations.

The -275 fs² GDD specification positions this mirror ideally for moderate-length beam paths in Ti:Sapphire amplifiers where 20–25 bounces can compensate 5,500–6,875 fs² of accumulated positive dispersion—eliminating the need for prism pairs while maintaining compact optical layouts. This GDD value bridges the gap between low-dispersion oscillator mirrors and ultra-high-dispersion compressor optics, providing versatile GVD control for multi-stage amplifier architectures.

Applications

• Ti:Sapphire CPA systems: Intracavity and post-amplifier dispersion compensation for 800nm regenerative and multipass amplifiers
• OPCPA pump line management: GDD pre-compensation for 785nm pump lasers driving optical parametric chirped pulse amplification stages
• External pulse compressors: Compact folded compressor designs for sub-picosecond Ti:Sapphire oscillators requiring 4,000–8,000 fs² total GDD correction
• OPA pumping optimization: Temporal stretching and pulse shaping for 800nm pump beams in nonlinear frequency conversion systems

Construction & Performance

Manufactured on 25.4 × 6.35 mm UVFS substrates with ion beam sputtering (IBS) dielectric coatings, this P-polarized chirped mirror achieves R>99.5% reflectance across the full 690–880 nm bandwidth at 7° angle of incidence (AOI). The broadband high-reflectivity coating maintains GDD specifications while minimizing losses in multi-bounce configurations. Sub-wavelength IBS layer precision ensures accurate dispersion control with minimal GDD ripple, critical for maintaining pulse fidelity in ultrafast laser systems. The 0.2 J/cm² laser-induced damage threshold supports femtosecond pulse energies typical of laboratory-scale Ti:Sapphire amplifiers.

Storage & Handling

Operate at 25 °C, 40–60% RH. Clean only with >99% optical-grade ethanol and lint-free lens tissue using single-pass drag method. Avoid abrasive cloths and water.