Chirped Chirped Mirror WQ-CM-1030-50

Overview

The WaveQuanta Chirped Mirror 1030nm (-50 fs² per bounce) delivers precision GDD compensation of -50 fs² per reflection, specifically engineered for ultrafast laser systems operating at 1030 nm. This low-dispersion chirped mirror is optimized for sub-10 fs and few-cycle pulse applications where minimal GDD adjustment per bounce enables fine-tuned dispersion control across extended optical paths.

With -50 fs² per bounce, this mirror excels in systems requiring distributed dispersion compensation over many reflections. Compensating typical CPA system dispersion of ~6000 fs² requires approximately 120 bounces, making this GDD value ideal for cavity architectures, multi-pass delay lines, and pulse shapers where gradual dispersion management prevents over-compensation. The 1030 nm design wavelength perfectly matches Yb:fiber and Yb:YAG ultrafast laser systems, including high-repetition-rate industrial and scientific platforms.

Applications

• Yb-doped fiber laser oscillators and amplifiers: Intracavity GDD compensation for mode-locked Yb:fiber systems generating sub-100 fs pulses at 1030 nm
• Multi-pass stretcher/compressor stages: Fine dispersion tuning in CPA and OPCPA systems requiring precise control over accumulated GDD
• Few-cycle pulse generation: Broadband dispersion management for sub-10 fs pulse compression at 1030 nm center wavelength
• Pulse characterization delay lines: Low-GDD reflections for FROG, SPIDER, and autocorrelation setups minimizing pulse distortion

Construction & Performance

Manufactured on UV-fused silica (UVFS) substrates providing exceptional thermal stability and low absorption at 1030 nm. Ion beam sputtering (IBS) produces dense, sub-nanometer multilayer coatings with -50 fs² GDD per bounce and high reflectance (R > 99.5%) for P-polarized light. Optimized for 0–10° angle of incidence (AOI) to maintain GDD consistency across typical optical configurations. Laser-induced damage threshold (LIDT) rated at 0.2 J/cm² for femtosecond pulse durations, suitable for high-peak-power ultrafast laser systems.

Storage & Handling

Operate at 25 °C, 40–60% RH. Clean only with >99% optical-grade ethanol and lint-free lens tissue using single-pass drag method. Avoid abrasive cloths and water.